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</script>纳米加工分为三个不同的领域：薄膜、光刻和蚀刻。关于薄膜，采用蒸镀等物理气相沉积方法；溅射；和脉冲激光和化学气相沉积对低压 CVD、等离子体增强 CVD 和原子层沉积等 (CVD) 进行了综述。关于光刻，首先讨论接触掩模光刻的原理，然后是紫外 (UV) 投影光刻，最后是用于集成电路制造的更先进的系统，如深紫外 193 纳米和浸没式光刻系统。简要回顾了诸如双图案和自对准图案等分辨率增强技术。还讨论了非光学光刻，例如电子束光刻、聚焦离子束光刻和纳米压印光刻。关于蚀刻的。主题包括湿法化学蚀刻、等离子蚀刻和深硅蚀刻中使用的技术。