{"id":26828,"date":"2022-06-07T15:53:46","date_gmt":"2022-06-07T07:53:46","guid":{"rendered":"https:\/\/www.accscicn.com\/?p=26828"},"modified":"2022-10-20T17:11:19","modified_gmt":"2022-10-20T09:11:19","slug":"nanofabrication_lithography","status":"publish","type":"post","link":"https:\/\/www.accscicn.com\/en\/solutions\/nanofabrication\/nanofabrication_lithography\/","title":{"rendered":"Micro and Nano Processing | Photolithography - Optical Lithography"},"content":{"rendered":"<div data-elementor-type=\"wp-post\" data-elementor-id=\"26828\" class=\"elementor elementor-26828\" data-elementor-post-type=\"post\">\n\t\t\t\t\t\t<section class=\"elementor-section elementor-top-section elementor-element elementor-element-4a069276 elementor-section-full_width elementor-section-stretched elementor-section-height-default elementor-section-height-default\" data-id=\"4a069276\" data-element_type=\"section\" data-settings=\"{&quot;stretch_section&quot;:&quot;section-stretched&quot;,&quot;background_background&quot;:&quot;classic&quot;}\">\n\t\t\t\t\t\t<div class=\"elementor-container elementor-column-gap-default\">\n\t\t\t\t\t<div class=\"elementor-column elementor-col-100 elementor-top-column elementor-element elementor-element-169565cb\" data-id=\"169565cb\" data-element_type=\"column\">\n\t\t\t<div class=\"elementor-widget-wrap elementor-element-populated\">\n\t\t\t\t\t\t<section class=\"elementor-section elementor-inner-section elementor-element elementor-element-4ac12e1e elementor-section-boxed elementor-section-height-default elementor-section-height-default\" data-id=\"4ac12e1e\" data-element_type=\"section\">\n\t\t\t\t\t\t<div class=\"elementor-container elementor-column-gap-default\">\n\t\t\t\t\t<div class=\"elementor-column elementor-col-50 elementor-inner-column elementor-element elementor-element-7e3b7427\" data-id=\"7e3b7427\" data-element_type=\"column\">\n\t\t\t<div class=\"elementor-widget-wrap elementor-element-populated\">\n\t\t\t\t\t\t<div class=\"elementor-element elementor-element-571fa7d3 elementor-widget elementor-widget-heading\" data-id=\"571fa7d3\" data-element_type=\"widget\" data-widget_type=\"heading.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t<style>\/*! elementor - v3.21.0 - 20-05-2024 *\/\n.elementor-heading-title{padding:0;margin:0;line-height:1}.elementor-widget-heading .elementor-heading-title[class*=elementor-size-]>a{color:inherit;font-size:inherit;line-height:inherit}.elementor-widget-heading .elementor-heading-title.elementor-size-small{font-size:15px}.elementor-widget-heading .elementor-heading-title.elementor-size-medium{font-size:19px}.elementor-widget-heading .elementor-heading-title.elementor-size-large{font-size:29px}.elementor-widget-heading .elementor-heading-title.elementor-size-xl{font-size:39px}.elementor-widget-heading .elementor-heading-title.elementor-size-xxl{font-size:59px}<\/style><h3 class=\"elementor-heading-title elementor-size-default\">Micro and Nano Processing | Photolithography - Optical Lithography<\/h3>\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-4bd6e2e5 elementor-widget elementor-widget-text-editor\" data-id=\"4bd6e2e5\" data-element_type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t<style>\/*! elementor - v3.21.0 - 20-05-2024 *\/\n.elementor-widget-text-editor.elementor-drop-cap-view-stacked .elementor-drop-cap{background-color:#69727d;color:#fff}.elementor-widget-text-editor.elementor-drop-cap-view-framed .elementor-drop-cap{color:#69727d;border:3px solid;background-color:transparent}.elementor-widget-text-editor:not(.elementor-drop-cap-view-default) .elementor-drop-cap{margin-top:8px}.elementor-widget-text-editor:not(.elementor-drop-cap-view-default) .elementor-drop-cap-letter{width:1em;height:1em}.elementor-widget-text-editor .elementor-drop-cap{float:left;text-align:center;line-height:1;font-size:50px}.elementor-widget-text-editor .elementor-drop-cap-letter{display:inline-block}<\/style>\t\t\t\t<section style=\"font-size: 14px;\"><p style=\"font-size: 14px;\"><span style=\"color: #051c2c; font-size: 16px;\">In Na<\/span><span style=\"color: #051c2c; font-size: 16px;\">meters<\/span><span style=\"color: #051c2c; font-size: 16px;\">and micro plus<\/span><span style=\"color: #051c2c; font-size: 16px;\">Work<\/span><span style=\"color: #051c2c; font-size: 16px;\">technology in the context of photolithography<\/span><span style=\"color: #051c2c; font-size: 16px;\">Use<\/span><span style=\"color: #051c2c; font-size: 16px;\">In the substrate table<\/span><span style=\"color: #051c2c; font-size: 16px;\">Face<\/span><span style=\"color: #051c2c; font-size: 16px;\">the above should<\/span><span style=\"color: #051c2c; font-size: 16px;\">Use<\/span><span style=\"color: #051c2c; font-size: 16px;\">pattern for subsequent transfer to the next<\/span><span style=\"color: #051c2c; font-size: 16px;\">Face<\/span><span style=\"color: #051c2c; font-size: 16px;\">on the substrate.<\/span><\/p><p><span style=\"color: #051c2c; font-size: 16px;\">Optical lithography uses light to copy patterns from a master (photomask) to a substrate. This process is very similar to traditional negative photographic reproduction. A photosensitive polymer (photoresist) is applied to the substrate and then exposed through a photomask. The exposed photoresist undergoes a chemical reaction that results in a change in solubility. This is then used to dissolve some of the photoresist, leaving the patterned photoresist behind. There are several different lithography techniques such as contact, projection, immersion and interferometry, as well as UV, deep UV, extreme UV and X-ray based methods.<\/span><\/p><p><span style=\"color: #051c2c; font-size: 16px;\">Non-optical lithography involves electron beam, ion beam or mechanical force to create patterns on resist films. They are electron beam lithography (EBL), focused ion beam (FIB) lithography, and nanoimprint lithography (NIL). These techniques and their limitations are briefly described in the following sections.<\/span><\/p><\/section><section><section style=\"display: flex; flex-flow: row nowrap;\"><section style=\"display: inline-block; vertical-align: middle; width: auto; flex: 0 0 0%; align-self: center; height: auto;\"><section style=\"text-align: center;\"><section style=\"display: inline-block; width: 33px; height: 33px; vertical-align: top; overflow: hidden; background-color: #0e2143;\"><section style=\"color: #ffffff; font-size: 18px; line-height: 2; letter-spacing: 0px;\"><\/section><\/section><\/section><\/section><section style=\"display: inline-block; vertical-align: middle; width: auto; align-self: center; flex: 100 100 0%;\"><section style=\"color: #051c2c; padding-right: 10px; padding-left: 10px;\"><p><span style=\"font-family: \u5fae\u8f6f\u96c5\u9ed1;\"><strong><span style=\"font-family: \u5b8b\u4f53, SimSun;\">Light source<\/span><\/strong><\/span><\/p><\/section><\/section><\/section><\/section><section style=\"margin: 15px 0%;\"><section style=\"color: #051c2c; line-height: 1.8;\"><p style=\"font-size: 14px;\"><span style=\"font-family: \u5fae\u8f6f\u96c5\u9ed1; font-size: 16px;\">UV light source usually<\/span><span style=\"font-family: \u5fae\u8f6f\u96c5\u9ed1; font-size: 16px;\">Use<\/span><span style=\"font-family: \u5fae\u8f6f\u96c5\u9ed1; font-size: 16px;\">In lithography. This is not only because of the better image resolution due to the short wavelengths, but also because the UV-sensitive photochemicals in the wireless environment make it possible to obtain a better image resolution.<\/span><span style=\"font-family: \u5fae\u8f6f\u96c5\u9ed1; font-size: 16px;\">Use<\/span><span style=\"font-family: \u5fae\u8f6f\u96c5\u9ed1; font-size: 16px;\">. Mercury vaporization<\/span><span style=\"font-family: \u5fae\u8f6f\u96c5\u9ed1; font-size: 16px;\">Gas<\/span><span style=\"font-family: \u5fae\u8f6f\u96c5\u9ed1; font-size: 16px;\">lamp is still the main UV light source in lithography, and its emission lines are<\/span><span style=\"font-family: \u5fae\u8f6f\u96c5\u9ed1; font-size: 16px;\">405nm (h line), 365nm (i line) and 254nm. which makes<\/span><span style=\"font-family: \u5fae\u8f6f\u96c5\u9ed1; font-size: 16px;\">Use<\/span><span style=\"font-family: \u5fae\u8f6f\u96c5\u9ed1; font-size: 16px;\">The most<\/span><span style=\"font-family: \u5fae\u8f6f\u96c5\u9ed1; font-size: 16px;\">365nm (i-line), and many photoresists have been developed for this spectral range. The need to obtain more and more<\/span><span style=\"font-family: \u5fae\u8f6f\u96c5\u9ed1; font-size: 16px;\">High<\/span><span style=\"font-family: \u5fae\u8f6f\u96c5\u9ed1; font-size: 16px;\">The resolution of the breast began to make<\/span><span style=\"font-family: \u5fae\u8f6f\u96c5\u9ed1; font-size: 16px;\">Use<\/span><span style=\"font-family: \u5fae\u8f6f\u96c5\u9ed1; font-size: 16px;\">Deep UV light sources, such as<\/span><span style=\"font-family: \u5fae\u8f6f\u96c5\u9ed1; font-size: 16px;\">248 and 193 nm quasi-subdivision<\/span><span style=\"font-family: \u5fae\u8f6f\u96c5\u9ed1; font-size: 16px;\">sub<\/span><span style=\"font-family: \u5fae\u8f6f\u96c5\u9ed1; font-size: 16px;\">Lasers.<\/span><span style=\"font-family: \u5fae\u8f6f\u96c5\u9ed1; font-size: 16px;\">Table of Contents<\/span><span style=\"font-family: \u5fae\u8f6f\u96c5\u9ed1; font-size: 16px;\">Formerly under development<\/span><span style=\"font-family: \u5fae\u8f6f\u96c5\u9ed1; font-size: 16px;\">13.5nm EUV light source. In lithography should<\/span><span style=\"font-family: \u5fae\u8f6f\u96c5\u9ed1; font-size: 16px;\">Use<\/span><span style=\"font-family: \u5fae\u8f6f\u96c5\u9ed1; font-size: 16px;\">In this case, the intensity of illumination must be in the entire substrate table<\/span><span style=\"font-family: \u5fae\u8f6f\u96c5\u9ed1; font-size: 16px;\">Face<\/span><span style=\"font-family: \u5fae\u8f6f\u96c5\u9ed1; font-size: 16px;\">Stay on<\/span><span style=\"font-family: \u5fae\u8f6f\u96c5\u9ed1; font-size: 16px;\">One<\/span><span style=\"font-family: \u5fae\u8f6f\u96c5\u9ed1; font-size: 16px;\">To.<\/span><span style=\"font-family: \u5fae\u8f6f\u96c5\u9ed1; font-size: 16px;\">High<\/span><span style=\"font-family: \u5fae\u8f6f\u96c5\u9ed1; font-size: 16px;\">The S beam is unacceptable and needs to be eliminated to<\/span><span style=\"font-family: \u5fae\u8f6f\u96c5\u9ed1; font-size: 16px;\">Since<\/span><span style=\"font-family: \u5fae\u8f6f\u96c5\u9ed1; font-size: 16px;\">The scatter pattern of the laser source. Therefore, the cost<\/span><span style=\"font-family: \u5fae\u8f6f\u96c5\u9ed1; font-size: 16px;\">Big<\/span><span style=\"font-family: \u5fae\u8f6f\u96c5\u9ed1; font-size: 16px;\">Measure energy to shape the beam into a flat, uniform profile.<\/span><\/p><\/section><\/section><section><section style=\"display: flex; flex-flow: row nowrap;\"><section style=\"display: inline-block; vertical-align: middle; width: auto; flex: 0 0 0%; align-self: center; height: auto;\"><section style=\"text-align: center;\"><section style=\"display: inline-block; width: 33px; height: 33px; vertical-align: top; overflow: hidden; background-color: #0e2143;\"><section style=\"color: #ffffff; font-size: 18px; line-height: 2; letter-spacing: 0px;\"><\/section><\/section><\/section><\/section><section style=\"display: inline-block; vertical-align: middle; width: auto; align-self: center; flex: 100 100 0%;\"><section style=\"color: #051c2c; padding-right: 10px; padding-left: 10px;\"><p><span style=\"font-family: \u5fae\u8f6f\u96c5\u9ed1;\"><strong><span style=\"font-family: \u5b8b\u4f53, SimSun;\">Photoresist<\/span><\/strong><\/span><\/p><\/section><\/section><\/section><\/section><section style=\"margin: 15px 0%;\"><section style=\"color: #051c2c; line-height: 1.8;\"><p><span style=\"font-family: \u5fae\u8f6f\u96c5\u9ed1;\">Photoresists are photosensitive organic polymers in solvents that are most often applied to substrates by spin coating. Photoresists consist of a photosensitive compound, a resin, and a solvent. The solvent<\/span><span style=\"font-family: \u5fae\u8f6f\u96c5\u9ed1;\">Table of Contents<\/span><span style=\"font-family: \u5fae\u8f6f\u96c5\u9ed1;\">s just to allow the photoresist to be spin coated. After the spin coating step, the solvent is removed by heating the photoresist. The resin is<\/span><span style=\"font-family: \u5fae\u8f6f\u96c5\u9ed1;\">Use<\/span><span style=\"font-family: \u5fae\u8f6f\u96c5\u9ed1;\">The structural composition of the photoresist for subsequent pattern transfer. In<\/span><span style=\"font-family: \u5fae\u8f6f\u96c5\u9ed1;\">Among i-line (365nm) photoresists, the most common<\/span><span style=\"font-family: \u5fae\u8f6f\u96c5\u9ed1;\">Use<\/span><span style=\"font-family: \u5fae\u8f6f\u96c5\u9ed1;\">The resin is a phenolic resin (belonging to the phenolic series). The photoactive compound is diazanonaphthoquinone<\/span><span style=\"font-family: \u5fae\u8f6f\u96c5\u9ed1;\">(DNQ). Upon exposure to UV light, DNQ releases<\/span><span style=\"font-family: \u5fae\u8f6f\u96c5\u9ed1;\">One<\/span><span style=\"font-family: \u5fae\u8f6f\u96c5\u9ed1;\">Species of photo acids from<\/span><span style=\"font-family: \u5fae\u8f6f\u96c5\u9ed1;\">And<\/span><span style=\"font-family: \u5fae\u8f6f\u96c5\u9ed1;\">Increases the solubility of the resin. This type of photoresist is also known as a positive photoresist because the exposed area is eventually removed and<\/span><span style=\"font-family: \u5fae\u8f6f\u96c5\u9ed1;\">And<\/span><span style=\"font-family: \u5fae\u8f6f\u96c5\u9ed1;\">Unexposed areas will be preserved. The dynamic range of solubility can be<\/span><span style=\"font-family: \u5fae\u8f6f\u96c5\u9ed1;\">Big<\/span><span style=\"font-family: \u5fae\u8f6f\u96c5\u9ed1;\">in three orders of magnitude and<\/span><span style=\"font-family: \u5fae\u8f6f\u96c5\u9ed1;\">High<\/span><span style=\"font-family: \u5fae\u8f6f\u96c5\u9ed1;\">degree<\/span><span style=\"font-family: \u5fae\u8f6f\u96c5\u9ed1;\">Not<\/span><span style=\"font-family: \u5fae\u8f6f\u96c5\u9ed1;\">Linearity, which is where lithography has out<\/span><span style=\"font-family: \u5fae\u8f6f\u96c5\u9ed1;\">color<\/span><span style=\"font-family: \u5fae\u8f6f\u96c5\u9ed1;\">Reasons for contrast.<\/span><\/p><p><span style=\"font-family: \u5fae\u8f6f\u96c5\u9ed1;\">Exposure is usually measured in millijoules of ears per square centimeter (mJ\/cm2). This is the illumination intensity in mW\/cm2 multiplied by the exposure time. Typical dose values range from 50 to 500 mJ\/cm2.<\/span><\/p><p><span style=\"font-family: \u5fae\u8f6f\u96c5\u9ed1;\">A commonly used variant is the negative photoresist. These photoresists have the opposite behavior, where the solubility of the photoresist decreases after exposure.<\/span><\/p><section><section style=\"display: flex; flex-flow: row nowrap;\"><section style=\"display: inline-block; vertical-align: middle; width: auto; flex: 0 0 0%; align-self: center; height: auto;\"><section style=\"text-align: center;\"><section style=\"display: inline-block; width: 33px; height: 33px; vertical-align: top; overflow: hidden; background-color: #0e2143;\"><section style=\"color: #ffffff; font-size: 18px; line-height: 2; letter-spacing: 0px;\"><\/section><\/section><\/section><\/section><section style=\"display: inline-block; vertical-align: middle; width: auto; align-self: center; flex: 100 100 0%;\"><section style=\"padding-right: 10px; padding-left: 10px;\"><p><strong><span style=\"font-family: \u5b8b\u4f53, SimSun;\">Photomasks<\/span><\/strong><\/p><\/section><\/section><\/section><\/section><section style=\"margin: 15px 0%;\"><section style=\"line-height: 1.8;\"><p><span style=\"font-family: \u5fae\u8f6f\u96c5\u9ed1;\">Photomasks are transparent glass substrates on which metal patterns are formed to block light transmission. This metal is usually chromium because it has excellent adhesion to glass and is very opaque to UV waves. A standard photolithography process is used to create the photomask, including the application of photoresist, exposure and pattern transfer to the chromium layer below.<\/span><\/p><p><span style=\"font-family: \u5fae\u8f6f\u96c5\u9ed1;\">\u00a0<\/span><\/p><p><span style=\"font-family: \u5fae\u8f6f\u96c5\u9ed1;\">However, for exposure, rather than photomasks, scanning tools such as laser use scanners or electron beam scanners. An ultraviolet laser source (e.g., HeCd or ArF) is used to raster scan the entire surface of the laser spot while turning the laser beam on and off with a software-driven fast lens containing the photomask design. Assuming a HeCd laser with a wavelength of 325 nm, the smallest spot size achievable is about 300 nm, and binary features such as lines may require multiple widths of the spot. Therefore, the commonly advertised limit for laser-written photomasks is about 1 mm. 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\"\t\t<\/a>\n\n\t\t\t\t<\/div>\n\t\t\t\t<\/article>\n\t\t\t\t<\/div>\n\t\t\n\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t<\/section>\n\t\t\t\t\t<\/div>\n\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t<\/section>\n\t\t\t\t<\/div>","protected":false},"excerpt":{"rendered":"<p>\u5fae\u7eb3\u52a0\u5de5 | \u5149\u523b-\u5149\u5b66\u5149\u523b\u7bc7 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