{"id":29236,"date":"2022-12-15T11:31:20","date_gmt":"2022-12-15T03:31:20","guid":{"rendered":"https:\/\/www.accscicn.com\/?p=29236"},"modified":"2023-06-08T18:24:03","modified_gmt":"2023-06-08T10:24:03","slug":"what-is-electron-beam-lithography","status":"publish","type":"post","link":"https:\/\/www.accscicn.com\/en\/solutions\/what-is-electron-beam-lithography\/","title":{"rendered":"Micro and Nano Processing\u4e28Electron Beam Lithography (EBL) Technology Introduction"},"content":{"rendered":"<div data-elementor-type=\"wp-post\" data-elementor-id=\"29236\" class=\"elementor elementor-29236\" data-elementor-post-type=\"post\">\n\t\t\t\t\t\t<section class=\"elementor-section elementor-top-section elementor-element elementor-element-7eb15ef elementor-section-stretched elementor-section-boxed elementor-section-height-default elementor-section-height-default\" data-id=\"7eb15ef\" data-element_type=\"section\" data-settings=\"{&quot;stretch_section&quot;:&quot;section-stretched&quot;}\">\n\t\t\t\t\t\t<div class=\"elementor-container elementor-column-gap-default\">\n\t\t\t\t\t<div class=\"elementor-column elementor-col-50 elementor-top-column elementor-element elementor-element-70e1828\" data-id=\"70e1828\" data-element_type=\"column\">\n\t\t\t<div class=\"elementor-widget-wrap elementor-element-populated\">\n\t\t\t\t\t\t<div class=\"elementor-element elementor-element-8821e50 elementor-widget elementor-widget-heading\" data-id=\"8821e50\" data-element_type=\"widget\" data-widget_type=\"heading.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t<style>\/*! elementor - v3.21.0 - 20-05-2024 *\/\n.elementor-heading-title{padding:0;margin:0;line-height:1}.elementor-widget-heading .elementor-heading-title[class*=elementor-size-]>a{color:inherit;font-size:inherit;line-height:inherit}.elementor-widget-heading .elementor-heading-title.elementor-size-small{font-size:15px}.elementor-widget-heading .elementor-heading-title.elementor-size-medium{font-size:19px}.elementor-widget-heading .elementor-heading-title.elementor-size-large{font-size:29px}.elementor-widget-heading .elementor-heading-title.elementor-size-xl{font-size:39px}.elementor-widget-heading .elementor-heading-title.elementor-size-xxl{font-size:59px}<\/style><h1 class=\"elementor-heading-title elementor-size-default\">Micro and Nano Processing\u4e28Electron Beam Lithography (EBL) Technology Introduction<\/h1>\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-5b4a554 elementor-toc--minimized-on-tablet elementor-widget elementor-widget-table-of-contents\" data-id=\"5b4a554\" data-element_type=\"widget\" data-settings=\"{&quot;headings_by_tags&quot;:[&quot;h2&quot;],&quot;exclude_headings_by_selector&quot;:[],&quot;marker_view&quot;:&quot;numbers&quot;,&quot;minimize_box&quot;:&quot;yes&quot;,&quot;minimized_on&quot;:&quot;tablet&quot;,&quot;hierarchical_view&quot;:&quot;yes&quot;,&quot;min_height&quot;:{&quot;unit&quot;:&quot;px&quot;,&quot;size&quot;:&quot;&quot;,&quot;sizes&quot;:[]},&quot;min_height_tablet&quot;:{&quot;unit&quot;:&quot;px&quot;,&quot;size&quot;:&quot;&quot;,&quot;sizes&quot;:[]},&quot;min_height_mobile&quot;:{&quot;unit&quot;:&quot;px&quot;,&quot;size&quot;:&quot;&quot;,&quot;sizes&quot;:[]}}\" data-widget_type=\"table-of-contents.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t<style>\/*! elementor-pro - v3.21.0 - 30-04-2024 *\/\n.elementor-widget-table-of-contents .elementor-toc__header-title{color:var(--header-color)}.elementor-widget-table-of-contents.elementor-toc--collapsed .elementor-toc__toggle-button--collapse,.elementor-widget-table-of-contents:not(.elementor-toc--collapsed) .elementor-toc__toggle-button--expand{display:none}.elementor-widget-table-of-contents .elementor-widget-container{min-height:var(--box-min-height);border:var(--box-border-width,1px) solid var(--box-border-color,#9da5ae);border-radius:var(--box-border-radius,3px);background-color:var(--box-background-color);transition:min-height .4s;overflow:hidden}.elementor-toc__header{display:flex;align-items:center;justify-content:space-between;padding:var(--box-padding,20px);background-color:var(--header-background-color);border-bottom:var(--separator-width,1px) solid var(--box-border-color,#9da5ae)}.elementor-toc__header-title{font-size:18px;margin:0;color:var(--header-color);flex-grow:1}.elementor-toc__toggle-button{cursor:pointer;display:inline-flex}.elementor-toc__toggle-button i{color:var(--toggle-button-color)}.elementor-toc__toggle-button svg{height:1em;width:1em;fill:var(--toggle-button-color)}.elementor-toc__spinner-container{text-align:center}.elementor-toc__spinner{font-size:2em}.elementor-toc__spinner.e-font-icon-svg{height:1em;width:1em}.elementor-toc__body{padding:var(--box-padding,20px);max-height:var(--toc-body-max-height);overflow-y:auto}.elementor-toc__body::-webkit-scrollbar{width:7px}.elementor-toc__body::-webkit-scrollbar-thumb{background-color:#babfc5;border-radius:10px}.elementor-toc__list-wrapper{list-style:none;padding:0}.elementor-toc__list-item{margin-bottom:.5em}.elementor-toc__list-item.elementor-item-active{font-weight:700}.elementor-toc__list-item .elementor-toc__list-wrapper{margin-top:.5em;margin-inline-start:var(--nested-list-indent,1em)}.elementor-toc__list-item-text{transition-duration:var(--item-text-transition-duration)}.elementor-toc__list-item-text:hover{color:var(--item-text-hover-color);-webkit-text-decoration:var(--item-text-hover-decoration);text-decoration:var(--item-text-hover-decoration)}.elementor-toc__list-item-text.elementor-item-active{color:var(--item-text-active-color);-webkit-text-decoration:var(--item-text-active-decoration);text-decoration:var(--item-text-active-decoration)}.elementor-toc__list-item-text-wrapper{display:flex;align-items:center}.elementor-toc__list-item-text-wrapper:before,.elementor-toc__list-item-text-wrapper i{margin-inline-end:8px;color:var(--marker-color)}.elementor-toc__list-item-text-wrapper svg{margin-inline-end:8px;fill:var(--marker-color);height:var(--marker-size,.5em);width:var(--marker-size,.5em)}.elementor-toc__list-item-text-wrapper i{font-size:var(--marker-size,.5em)}.elementor-toc__list-item-text-wrapper:before{font-size:var(--marker-size,1em)}.elementor-toc--content-ellipsis .elementor-toc__list-item-text{white-space:nowrap;overflow:hidden;text-overflow:ellipsis}.elementor-toc__list-items--collapsible>.elementor-toc__list-wrapper>.elementor-toc__list-item>.elementor-toc__list-wrapper{display:none}.elementor-toc__heading-anchor{position:absolute}.elementor-toc__body .elementor-toc__list-item-text{color:var(--item-text-color);-webkit-text-decoration:var(--item-text-decoration);text-decoration:var(--item-text-decoration);transition-duration:var(--item-text-transition-duration)}.elementor-toc__body .elementor-toc__list-item-text:hover{color:var(--item-text-hover-color);-webkit-text-decoration:var(--item-text-hover-decoration);text-decoration:var(--item-text-hover-decoration)}.elementor-toc__body .elementor-toc__list-item-text.elementor-item-active{color:var(--item-text-active-color);-webkit-text-decoration:var(--item-text-active-decoration);text-decoration:var(--item-text-active-decoration)}ol.elementor-toc__list-wrapper{counter-reset:item}ol.elementor-toc__list-wrapper .elementor-toc__list-item{counter-increment:item}ol.elementor-toc__list-wrapper .elementor-toc__list-item-text-wrapper:before{content:counters(item,\".\") \". \"}<\/style>\t\t<div class=\"elementor-toc__header\">\n\t\t\t<div class=\"elementor-toc__header-title\">\n\t\t\t\tCatalog\t\t\t<\/div>\n\t\t\t\t\t\t\t<div class=\"elementor-toc__toggle-button elementor-toc__toggle-button--expand\" role=\"button\" tabindex=\"0\" aria-controls=\"elementor-toc__5b4a554\" aria-expanded=\"true\" aria-label=\"Open table of contents\"><i aria-hidden=\"true\" class=\"fas fa-chevron-down\"><\/i><\/div>\n\t\t\t\t<div class=\"elementor-toc__toggle-button elementor-toc__toggle-button--collapse\" role=\"button\" tabindex=\"0\" aria-controls=\"elementor-toc__5b4a554\" aria-expanded=\"true\" aria-label=\"Close table of contents\"><i aria-hidden=\"true\" class=\"fas fa-chevron-up\"><\/i><\/div>\n\t\t\t\t\t<\/div>\n\t\t<div id=\"elementor-toc__5b4a554\" class=\"elementor-toc__body\">\n\t\t\t<div class=\"elementor-toc__spinner-container\">\n\t\t\t\t<i class=\"elementor-toc__spinner eicon-animation-spin eicon-loading\" aria-hidden=\"true\"><\/i>\t\t\t<\/div>\n\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-092599b elementor-widget elementor-widget-heading\" data-id=\"092599b\" data-element_type=\"widget\" data-widget_type=\"heading.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t<h2 class=\"elementor-heading-title elementor-size-default\">What is electron beam lithography?<\/h2>\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-852229a elementor-widget elementor-widget-text-editor\" data-id=\"852229a\" data-element_type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t<style>\/*! elementor - v3.21.0 - 20-05-2024 *\/\n.elementor-widget-text-editor.elementor-drop-cap-view-stacked .elementor-drop-cap{background-color:#69727d;color:#fff}.elementor-widget-text-editor.elementor-drop-cap-view-framed .elementor-drop-cap{color:#69727d;border:3px solid;background-color:transparent}.elementor-widget-text-editor:not(.elementor-drop-cap-view-default) .elementor-drop-cap{margin-top:8px}.elementor-widget-text-editor:not(.elementor-drop-cap-view-default) .elementor-drop-cap-letter{width:1em;height:1em}.elementor-widget-text-editor .elementor-drop-cap{float:left;text-align:center;line-height:1;font-size:50px}.elementor-widget-text-editor .elementor-drop-cap-letter{display:inline-block}<\/style>\t\t\t\t<p style=\"font-size: 18px; font-style: normal; font-weight: 300; color: #000000;\">Electron beam lithography (e-beam lithography; EBL) is a kind of maskless lithography, which uses focused electrons with very short wavelengths to directly act on the surface of the electron-sensitive photoresist (resist) to draw micro and nano structures that match the designed pattern. EBL systems have the advantages of ultra-high resolution (graphic transfer with a limit size of &lt;10 nm) and flexible mapping (direct writing without mask), but due to low exposure efficiency and complex control, EBL is more often used for making lithography masks, advanced principle prototypes and nanoscale scientific research and development.<\/p>\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-065bf11 elementor-widget elementor-widget-spacer\" data-id=\"065bf11\" data-element_type=\"widget\" data-widget_type=\"spacer.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t<style>\/*! elementor - v3.21.0 - 20-05-2024 *\/\n.elementor-column .elementor-spacer-inner{height:var(--spacer-size)}.e-con{--container-widget-width:100%}.e-con-inner>.elementor-widget-spacer,.e-con>.elementor-widget-spacer{width:var(--container-widget-width,var(--spacer-size));--align-self:var(--container-widget-align-self,initial);--flex-shrink:0}.e-con-inner>.elementor-widget-spacer>.elementor-widget-container,.e-con>.elementor-widget-spacer>.elementor-widget-container{height:100%;width:100%}.e-con-inner>.elementor-widget-spacer>.elementor-widget-container>.elementor-spacer,.e-con>.elementor-widget-spacer>.elementor-widget-container>.elementor-spacer{height:100%}.e-con-inner>.elementor-widget-spacer>.elementor-widget-container>.elementor-spacer>.elementor-spacer-inner,.e-con>.elementor-widget-spacer>.elementor-widget-container>.elementor-spacer>.elementor-spacer-inner{height:var(--container-widget-height,var(--spacer-size))}.e-con-inner>.elementor-widget-spacer.elementor-widget-empty,.e-con>.elementor-widget-spacer.elementor-widget-empty{position:relative;min-height:22px;min-width:22px}.e-con-inner>.elementor-widget-spacer.elementor-widget-empty .elementor-widget-empty-icon,.e-con>.elementor-widget-spacer.elementor-widget-empty .elementor-widget-empty-icon{position:absolute;top:0;bottom:0;left:0;right:0;margin:auto;padding:0;width:22px;height:22px}<\/style>\t\t<div class=\"elementor-spacer\">\n\t\t\t<div class=\"elementor-spacer-inner\"><\/div>\n\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-5ce1adb elementor-widget elementor-widget-heading\" data-id=\"5ce1adb\" data-element_type=\"widget\" data-widget_type=\"heading.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t<h2 class=\"elementor-heading-title elementor-size-default\">Development History<\/h2>\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-8ab00fa elementor-widget elementor-widget-text-editor\" data-id=\"8ab00fa\" data-element_type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t<div data-page-id=\"UGy9d0v5UoJAVxxcSQFcybhsnwb\" data-docx-has-block-data=\"false\"><div class=\"ace-line ace-line old-record-id-MCIKdoCekoKWOIxWKqncpINunlf\">The core of the electron beam lithography system is the focused electron beam, and the application of focused electron beam started from the early 20th century, the earliest application was the application of cathode ray tube in the display, then in the 1960s came the emergence of scanning electron microscope, the structure of scanning electron microscope has no essential difference with the electron beam exposure machine. But the use of focused electron beam exposure to produce fine graphics began with the advent of electron beam photoresist (resist). The development of electron beam lithography has a history of more than 60 years, he is almost synchronized with the development of optical exposure, the main landmark time are the following.<\/div><\/div>\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-778fc74 elementor-widget elementor-widget-text-editor\" data-id=\"778fc74\" data-element_type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t<div data-page-id=\"XNWvd0Er4ogPewxzjOMcotAXn9e\" data-docx-has-block-data=\"false\"><ul class=\"list-bullet1\"><li class=\"ace-line ace-line old-record-id-RUwWdmayQok2IgxwTjCcqPlhn9e\" data-list=\"bullet\"><div>MIT researchers first used electron-induced carbon contamination to form etching masks to produce high-resolution two-dimensional graphic structures in 1958<\/div><\/li><li class=\"ace-line ace-line old-record-id-NOOMdmeACoiSwux8TJjcYgbznNd\" data-list=\"bullet\"><div>100nm structures were made using electron beam exposure as early as 1965<\/div><\/li><li class=\"ace-line ace-line old-record-id-YQWEdu0keoGeGex8dYIcFrSGnjh\" data-list=\"bullet\"><div>PMMA was used as an electron beam photoresist in 1968<\/div><\/li><li class=\"ace-line ace-line old-record-id-C2y2dyAY6ookokxt1tscnm3rnsI\" data-list=\"bullet\"><div>1970: 0.15um sound surface wave device made with PMMA<\/div><\/li><li class=\"ace-line ace-line old-record-id-EEisdCQiQoCOSqx4rQicbkVin2g\" data-list=\"bullet\"><div>1972: 60x60nm aluminum metal lines with cross-section on silicon surface using electron beam lithography<\/div><\/li><\/ul><\/div>\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-806e66f elementor-widget elementor-widget-text-editor\" data-id=\"806e66f\" data-element_type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t<p>In the 1980s, it was widely believed at that time that optical exposure had come to an end and electron beam lithography was the most promising alternative means, however, more than 30 years have passed and electron beam lithography still cannot replace optical exposure. The development of the two lithography technologies has gradually formed a complementary pattern, and it is believed that this pattern will continue to be maintained for a long time.<\/p>\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-f76c920 elementor-widget elementor-widget-spacer\" data-id=\"f76c920\" data-element_type=\"widget\" data-widget_type=\"spacer.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t<div class=\"elementor-spacer\">\n\t\t\t<div class=\"elementor-spacer-inner\"><\/div>\n\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-6dc7543 elementor-widget elementor-widget-heading\" data-id=\"6dc7543\" data-element_type=\"widget\" data-widget_type=\"heading.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t<h2 class=\"elementor-heading-title elementor-size-default\">Theoretical basis<\/h2>\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-ad66ac6 elementor-widget elementor-widget-text-editor\" data-id=\"ad66ac6\" data-element_type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t<p>Lithography is the use of light irradiation polymer generated by the changes in the formation of graphics, the resolution of optical exposure is limited by the wavelength of light, in order to improve the resolution of optical exposure, the choice of light wave has undergone the development process from G line to I line, deep ultraviolet, extreme ultraviolet continuously shortened.<\/p><p>The electron beam is essentially a charged particle, and according to the wave-particle duality theory, its wavelength is<\/p>\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-159ab9a elementor-widget elementor-widget-image\" data-id=\"159ab9a\" data-element_type=\"widget\" data-widget_type=\"image.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t<style>\/*! elementor - v3.21.0 - 20-05-2024 *\/\n.elementor-widget-image{text-align:center}.elementor-widget-image a{display:inline-block}.elementor-widget-image a img[src$=\".svg\"]{width:48px}.elementor-widget-image img{vertical-align:middle;display:inline-block}<\/style>\t\t\t\t\t\t\t\t\t\t<img decoding=\"async\" width=\"240\" height=\"86\" src=\"https:\/\/www.accscicn.com\/wp-content\/uploads\/2022\/12\/\u7406\u8bba\u57fa\u7840.png\" class=\"attachment-large size-large wp-image-29240\" alt=\"\" \/>\t\t\t\t\t\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-67e537b elementor-widget elementor-widget-text-editor\" data-id=\"67e537b\" data-element_type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t<div data-page-id=\"XNWvd0Er4ogPewxzjOMcotAXn9e\" data-docx-has-block-data=\"false\"><div class=\"ace-line ace-line old-record-id-FgiEdU0yiosesexo5VBcw9Vunfh\">From this, it can be seen that the higher the electron beam acceleration voltage, the smaller the wavelength of the electron beam, which is directly related to the electron beam exposure system is a high voltage system or a low voltage system. Therefore, the electron wavelength at 100KV acceleration voltage system is 0.12nm, which is the basis for its high resolution. Conventional electron beam lithography uses direct writing mode, which is also an important factor for the relatively low efficiency of current electron beam lithography, but its advantage is that direct writing does not require mask version, simple and flexible.<\/div><div class=\"ace-line ace-line old-record-id-FgiEdU0yiosesexo5VBcw9Vunfh\">\u00a0<\/div><div class=\"ace-line ace-line old-record-id-FgiEdU0yiosesexo5VBcw9Vunfh\"><span style=\"font-size: 1rem;\">The electron beam, like UV light, can cause some polymers to break chemical bonds or cross-linking reactions to form corresponding graphics in the development process, and some UV photoresists themselves can be used as electron beam photoresists, so there is not much difference between the two in essence, and to distinguish, we sometimes call electron beam photoresists resists. However, due to the scattering of the electron beam when it acts on the material, the process is much more complicated than that of UV lithography.<\/span><\/div><\/div>\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-19d5c2d elementor-widget elementor-widget-spacer\" data-id=\"19d5c2d\" data-element_type=\"widget\" data-widget_type=\"spacer.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t<div class=\"elementor-spacer\">\n\t\t\t<div class=\"elementor-spacer-inner\"><\/div>\n\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-74e2241 elementor-widget elementor-widget-heading\" data-id=\"74e2241\" data-element_type=\"widget\" data-widget_type=\"heading.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t<h2 class=\"elementor-heading-title elementor-size-default\">Electron beam exposure system<\/h2>\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-49be5e4 elementor-widget elementor-widget-text-editor\" data-id=\"49be5e4\" data-element_type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t<div data-page-id=\"XNWvd0Er4ogPewxzjOMcotAXn9e\" data-docx-has-block-data=\"false\">Electron beam lithography originated from scanning electron microscopy and is a graphic transfer technology based on the principle of focused electron beam scanning. The electron beam lithography system consists of three basic components: electron gun, electron lens, electron deflector and auxiliary components such as vacuum system, workpiece table control system, etc. The electron gun is used to generate electrons that can be controlled and focused. The electron gun is used to produce electrons that can be controlled and focused.\u00a0<br \/><ul><li>The hot electron source is to heat the cathode to a high enough temperature that the electrons in the cathode material can gain enough kinetic energy to enable the electrons to break through the potential barrier of the electron gun metal work function and be emitted to form an electron beam.\u00a0<\/li><li>The field emission source is formed by strengthening the electric field, which makes electrons tunnel through the potential barrier to form the electron source. The focusing and deflection of the electron beam from the electron emitting source is done in the electron beam column, which consists of a series of electron lenses, diaphragms, baffles and other devices. The electrons are shaped by the diaphragm, converge into a beam spot by the electron lens, and are exposed on the bench by the deflection system.<\/li><\/ul><\/div>\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-832cb77 elementor-widget elementor-widget-image\" data-id=\"832cb77\" data-element_type=\"widget\" data-widget_type=\"image.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t\t\t\t\t\t\t<img fetchpriority=\"high\" decoding=\"async\" width=\"1711\" height=\"1904\" src=\"https:\/\/www.accscicn.com\/wp-content\/uploads\/2022\/12\/\u7535\u5b50\u675f\u66dd\u5149\u7cfb\u7edf\u793a\u610f\u56fe.jpg\" class=\"attachment-full size-full wp-image-29244\" alt=\"\" srcset=\"https:\/\/www.accscicn.com\/wp-content\/uploads\/2022\/12\/\u7535\u5b50\u675f\u66dd\u5149\u7cfb\u7edf\u793a\u610f\u56fe.jpg 1711w, https:\/\/www.accscicn.com\/wp-content\/uploads\/2022\/12\/\u7535\u5b50\u675f\u66dd\u5149\u7cfb\u7edf\u793a\u610f\u56fe-270x300.jpg 270w, https:\/\/www.accscicn.com\/wp-content\/uploads\/2022\/12\/\u7535\u5b50\u675f\u66dd\u5149\u7cfb\u7edf\u793a\u610f\u56fe-920x1024.jpg 920w, https:\/\/www.accscicn.com\/wp-content\/uploads\/2022\/12\/\u7535\u5b50\u675f\u66dd\u5149\u7cfb\u7edf\u793a\u610f\u56fe-768x855.jpg 768w, https:\/\/www.accscicn.com\/wp-content\/uploads\/2022\/12\/\u7535\u5b50\u675f\u66dd\u5149\u7cfb\u7edf\u793a\u610f\u56fe-1380x1536.jpg 1380w\" sizes=\"(max-width: 1711px) 100vw, 1711px\" \/>\t\t\t\t\t\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-d408503 elementor-widget elementor-widget-spacer\" data-id=\"d408503\" data-element_type=\"widget\" data-widget_type=\"spacer.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t<div class=\"elementor-spacer\">\n\t\t\t<div class=\"elementor-spacer-inner\"><\/div>\n\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-0f00f0b elementor-widget elementor-widget-heading\" data-id=\"0f00f0b\" data-element_type=\"widget\" data-widget_type=\"heading.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t<h3 class=\"elementor-heading-title elementor-size-default\">Important indicators for electron beam exposure systems<\/h3>\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-15d7f19 elementor-widget elementor-widget-text-editor\" data-id=\"15d7f19\" data-element_type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t<div data-page-id=\"XNWvd0Er4ogPewxzjOMcotAXn9e\" data-docx-has-block-data=\"false\"><ul class=\"list-bullet1\"><li class=\"ace-line ace-line old-record-id-FQgMds6SOoMAKcxodIec3macnbd\" data-list=\"bullet\"><div><b>Minimum bundle diameter.<\/b>directly affects the minimum size of the exposure pattern. Smaller spot diameters can be obtained by adjusting the following measures: \u2460 setting the acceleration voltage as high as possible \u2461 using a smaller size diaphragm aperture \u2462 using a smaller working distance \u2463 setting a smaller scanning field \u2464 setting a smaller exposure step<\/div><\/li><li class=\"ace-line ace-line old-record-id-TaC8dY8SUoWWEuxUtyjcVa0pnpg\" data-list=\"bullet\"><div><b>Acceleration voltage.<\/b>Generally, the higher the acceleration voltage of 10~100kv, the higher the resolution, the smaller the proximity effect produced by the exposure, and the thicker the resist can be exposed.<\/div><\/li><li class=\"ace-line ace-line old-record-id-K6kAdESoUoy8G0x46KPcRVawnIb\" data-list=\"bullet\"><div><b>Electron beam flow.<\/b>The larger the beam current the faster the exposure speed, the maximum exposure speed is limited by the scanning frequency, the beam spot of large beam current will also be larger<\/div><\/li><li class=\"ace-line ace-line old-record-id-TUEYdmsWYoCkeAxWk0OcApntnAc\" data-list=\"bullet\"><div><b>Scanning speed.<\/b>The faster the scan speed the faster the exposure speed, expressed in terms of frequency (e.g.: 50MHz)<\/div><\/li><li class=\"ace-line ace-line old-record-id-BqEQdKYgmou2skxagHdcSkPSnjh\" data-list=\"bullet\"><div><b>Scanning field size.<\/b>Scanning field is large, the majority of the exposed graphics can be exposed in the scanning field to avoid errors caused by the stitching of the scanning field<\/div><\/li><li class=\"ace-line ace-line old-record-id-Fk8qdqas4oYEMUxsVh5cDPeLnBe\" data-list=\"bullet\"><div>There are also table movement accuracy, registration accuracy, field splicing accuracy, etc.<\/div><\/li><\/ul><\/div>\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-22fb227 elementor-widget elementor-widget-spacer\" data-id=\"22fb227\" data-element_type=\"widget\" data-widget_type=\"spacer.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t<div class=\"elementor-spacer\">\n\t\t\t<div class=\"elementor-spacer-inner\"><\/div>\n\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-1c31e25 elementor-widget elementor-widget-heading\" data-id=\"1c31e25\" data-element_type=\"widget\" data-widget_type=\"heading.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t<h3 class=\"elementor-heading-title elementor-size-default\">Electron beam exposure method classification<\/h3>\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-32be761 elementor-widget elementor-widget-heading\" data-id=\"32be761\" data-element_type=\"widget\" data-widget_type=\"heading.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t<h3 class=\"elementor-heading-title elementor-size-default\">Classified by working mode<\/h3>\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-c68b8fd elementor-widget elementor-widget-text-editor\" data-id=\"c68b8fd\" data-element_type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t<p>Projection exposure (mask required) and direct exposure (no mask required)<\/p>\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-4c11ef7 elementor-widget elementor-widget-image\" data-id=\"4c11ef7\" data-element_type=\"widget\" data-widget_type=\"image.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t\t\t\t\t\t\t<img decoding=\"async\" width=\"1024\" height=\"664\" src=\"https:\/\/www.accscicn.com\/wp-content\/uploads\/2022\/12\/\u76f4\u5199\u5f0f\u7535\u5b50\u675f\u66dd\u5149\u548c\u6295\u5f71\u5f0f\u7535\u5b50\u675f\u66dd\u5149-1024x664.jpg\" class=\"attachment-large size-large wp-image-29245\" alt=\"\" srcset=\"https:\/\/www.accscicn.com\/wp-content\/uploads\/2022\/12\/\u76f4\u5199\u5f0f\u7535\u5b50\u675f\u66dd\u5149\u548c\u6295\u5f71\u5f0f\u7535\u5b50\u675f\u66dd\u5149-1024x664.jpg 1024w, https:\/\/www.accscicn.com\/wp-content\/uploads\/2022\/12\/\u76f4\u5199\u5f0f\u7535\u5b50\u675f\u66dd\u5149\u548c\u6295\u5f71\u5f0f\u7535\u5b50\u675f\u66dd\u5149-300x195.jpg 300w, https:\/\/www.accscicn.com\/wp-content\/uploads\/2022\/12\/\u76f4\u5199\u5f0f\u7535\u5b50\u675f\u66dd\u5149\u548c\u6295\u5f71\u5f0f\u7535\u5b50\u675f\u66dd\u5149-768x498.jpg 768w, https:\/\/www.accscicn.com\/wp-content\/uploads\/2022\/12\/\u76f4\u5199\u5f0f\u7535\u5b50\u675f\u66dd\u5149\u548c\u6295\u5f71\u5f0f\u7535\u5b50\u675f\u66dd\u5149.jpg 1119w\" sizes=\"(max-width: 1024px) 100vw, 1024px\" \/>\t\t\t\t\t\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-6b42c7c elementor-widget elementor-widget-spacer\" data-id=\"6b42c7c\" data-element_type=\"widget\" data-widget_type=\"spacer.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t<div class=\"elementor-spacer\">\n\t\t\t<div class=\"elementor-spacer-inner\"><\/div>\n\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-9aa12d7 elementor-widget elementor-widget-heading\" data-id=\"9aa12d7\" data-element_type=\"widget\" data-widget_type=\"heading.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t<h3 class=\"elementor-heading-title elementor-size-default\">Divided by scanning method<\/h3>\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-d40ed84 elementor-widget elementor-widget-text-editor\" data-id=\"d40ed84\" data-element_type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t<p>Divided into raster scan (raster scan) and vector scan (vector scan)<\/p>\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-962381b elementor-widget elementor-widget-image\" data-id=\"962381b\" data-element_type=\"widget\" data-widget_type=\"image.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t\t\t\t\t\t\t<img loading=\"lazy\" decoding=\"async\" width=\"959\" height=\"469\" src=\"https:\/\/www.accscicn.com\/wp-content\/uploads\/2022\/12\/\u5149\u6805\u626b\u63cf\u548c\u77e2\u91cf\u626b\u63cf.jpg\" class=\"attachment-large size-large wp-image-29246\" alt=\"\" srcset=\"https:\/\/www.accscicn.com\/wp-content\/uploads\/2022\/12\/\u5149\u6805\u626b\u63cf\u548c\u77e2\u91cf\u626b\u63cf.jpg 959w, https:\/\/www.accscicn.com\/wp-content\/uploads\/2022\/12\/\u5149\u6805\u626b\u63cf\u548c\u77e2\u91cf\u626b\u63cf-300x147.jpg 300w, https:\/\/www.accscicn.com\/wp-content\/uploads\/2022\/12\/\u5149\u6805\u626b\u63cf\u548c\u77e2\u91cf\u626b\u63cf-768x376.jpg 768w\" sizes=\"(max-width: 959px) 100vw, 959px\" \/>\t\t\t\t\t\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-e080234 elementor-widget elementor-widget-text-editor\" data-id=\"e080234\" data-element_type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t<div data-page-id=\"XNWvd0Er4ogPewxzjOMcotAXn9e\" data-docx-has-block-data=\"false\"><ul><li><div class=\"ace-line ace-line old-record-id-XQ6kdKEKKo2804xMvHacQEA5nUd\" style=\"font-style: inherit; font-weight: inherit; display: inline !important;\"><strong>Raster scanning<\/strong><\/div><span style=\"font-style: inherit; font-weight: inherit; font-size: 1rem;\">The Gaussian circular beam is used, and the electron beam is scanned continuously point by point throughout the scanning field, and the exposure of the image is performed by controlling the shutter (beam gate) on and off.<\/span>The advantages of raster scanning are simple control and no control of the deflection system is required. The disadvantage is low production efficiency. Because of the small scanning field, the exposure must be done in conjunction with the movement of the workpiece table.<\/li><\/ul>\n<div class=\"ace-line ace-line old-record-id-AW6QdCkKkomCKIx2nPacrDn1nHh\" style=\"font-style: inherit; font-weight: inherit;\">\n<ul>\n<li><strong>Vector scan<\/strong>The advantages of vector scanning are high exposure efficiency, scanning exposure only in the graphic area, reducing the time spent by the lens in non-graphic areas, and the possibility of using a variable rectangular beam. The disadvantage is the complexity of the control system, because vector scanning must control the deflector, unlike raster scanning with a fixed deflection.<\/li>\n<\/ul>\n<\/div>\n<ul class=\"list-bullet1\">\n<\/ul>\n<\/div>\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-0e4bf2f elementor-widget elementor-widget-heading\" data-id=\"0e4bf2f\" data-element_type=\"widget\" data-widget_type=\"heading.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t<h3 class=\"elementor-heading-title elementor-size-default\">According to the electron beam shape is divided into<\/h3>\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-81a4dcd elementor-widget elementor-widget-text-editor\" data-id=\"81a4dcd\" data-element_type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t<div data-page-id=\"XNWvd0Er4ogPewxzjOMcotAXn9e\" data-docx-has-block-data=\"false\"><div class=\"ace-line ace-line old-record-id-TgYgdgkUCo6eO0xmm50coyxBnpe\">Divided into Gaussian beams (circular beams) and deformed electron beams (rectangular beams)<\/div><\/div>\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-1423dd3 elementor-widget elementor-widget-image\" data-id=\"1423dd3\" data-element_type=\"widget\" data-widget_type=\"image.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t\t\t\t\t\t\t<img loading=\"lazy\" decoding=\"async\" width=\"1024\" height=\"557\" src=\"https:\/\/www.accscicn.com\/wp-content\/uploads\/2022\/12\/3\u79cd\u4e0d\u540c\u675f\u6591\u6a21\u5f0f-1024x557.jpg\" class=\"attachment-large size-large wp-image-29247\" alt=\"\" srcset=\"https:\/\/www.accscicn.com\/wp-content\/uploads\/2022\/12\/3\u79cd\u4e0d\u540c\u675f\u6591\u6a21\u5f0f-1024x557.jpg 1024w, https:\/\/www.accscicn.com\/wp-content\/uploads\/2022\/12\/3\u79cd\u4e0d\u540c\u675f\u6591\u6a21\u5f0f-300x163.jpg 300w, https:\/\/www.accscicn.com\/wp-content\/uploads\/2022\/12\/3\u79cd\u4e0d\u540c\u675f\u6591\u6a21\u5f0f-768x418.jpg 768w, https:\/\/www.accscicn.com\/wp-content\/uploads\/2022\/12\/3\u79cd\u4e0d\u540c\u675f\u6591\u6a21\u5f0f.jpg 1258w\" sizes=\"(max-width: 1024px) 100vw, 1024px\" \/>\t\t\t\t\t\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-4dfbf5b elementor-widget elementor-widget-text-editor\" data-id=\"4dfbf5b\" data-element_type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t<p>In vector scanning mode, the exposure time of the pattern is related to the number of beam spot projections.<span style=\"font-style: inherit; font-weight: inherit;\">In the fixed Gaussian beam (circular beam) spot mode, we need to perform 24 projections.\u00a0<\/span><\/p><p>To speed up the exposure rate, the pattern can be decomposed into a combination of the smallest basic pattern, using the smallest basic pattern as the shape of the electron beam spot. Only 6 projections are required in this corrected beam spot mode.<\/p><p>\u00a0However, in the real production process the pattern is not constant and the basic beam spot shape needs to be reset frequently, so a more flexible projection method is needed. A variable beam spot mode can be applied to the case of diverse patterns. As shown in the figure below, in the variable beam pattern mode, the electron beam spot can be adjusted to the specific pattern, changing the basic beam spot shape and reducing the number of projections to three.<\/p>\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-156fee9 elementor-widget elementor-widget-spacer\" data-id=\"156fee9\" data-element_type=\"widget\" data-widget_type=\"spacer.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t<div class=\"elementor-spacer\">\n\t\t\t<div class=\"elementor-spacer-inner\"><\/div>\n\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-e785c77 elementor-widget elementor-widget-heading\" data-id=\"e785c77\" data-element_type=\"widget\" data-widget_type=\"heading.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t<h2 class=\"elementor-heading-title elementor-size-default\">Introduction to Electron Beam Photoresists<\/h2>\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-dcabd85 elementor-widget elementor-widget-text-editor\" data-id=\"dcabd85\" data-element_type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t<p><strong>Photoresist<\/strong> (Photoresist; also known as photoresist ) is an etch-resistant film material whose solubility is changed by irradiation or radiation from light sources such as ultraviolet light, excimer laser, electron beam, ion beam, and X-ray.<\/p><p><b>Electron beam photoresists are usually divided into positive and negative photoresists<\/b>, can be divided according to who dominates the cross-linking reaction or chemical bond breakage after photoresist irradiation.<strong>Photoresist positive and negative characteristics are not absolute<\/strong>, for example, electron beam positive adhesive PMMA at 10 times the normal exposure dose, the adhesive in the exposed area carbonizes, resulting in residuals during development, and its properties can be used as a negative adhesive.<\/p>\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-d932e1c elementor-widget elementor-widget-image\" data-id=\"d932e1c\" data-element_type=\"widget\" data-widget_type=\"image.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t\t\t\t\t\t\t<img loading=\"lazy\" decoding=\"async\" width=\"1024\" height=\"589\" src=\"https:\/\/www.accscicn.com\/wp-content\/uploads\/2022\/12\/PMMA-\u5316\u5b66\u952e\u65ad\u88c2\u548c\u4ea4\u8054\u8fc7\u7a0b\u793a\u610f\u56fe-1024x589.jpg\" class=\"attachment-large size-large wp-image-29248\" alt=\"\" srcset=\"https:\/\/www.accscicn.com\/wp-content\/uploads\/2022\/12\/PMMA-\u5316\u5b66\u952e\u65ad\u88c2\u548c\u4ea4\u8054\u8fc7\u7a0b\u793a\u610f\u56fe-1024x589.jpg 1024w, https:\/\/www.accscicn.com\/wp-content\/uploads\/2022\/12\/PMMA-\u5316\u5b66\u952e\u65ad\u88c2\u548c\u4ea4\u8054\u8fc7\u7a0b\u793a\u610f\u56fe-300x173.jpg 300w, https:\/\/www.accscicn.com\/wp-content\/uploads\/2022\/12\/PMMA-\u5316\u5b66\u952e\u65ad\u88c2\u548c\u4ea4\u8054\u8fc7\u7a0b\u793a\u610f\u56fe-768x442.jpg 768w, https:\/\/www.accscicn.com\/wp-content\/uploads\/2022\/12\/PMMA-\u5316\u5b66\u952e\u65ad\u88c2\u548c\u4ea4\u8054\u8fc7\u7a0b\u793a\u610f\u56fe.jpg 1237w\" sizes=\"(max-width: 1024px) 100vw, 1024px\" \/>\t\t\t\t\t\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-3d4ed47 elementor-widget elementor-widget-text-editor\" data-id=\"3d4ed47\" data-element_type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t<p><strong>Positive photoresist (positive adhesive): the chemical bond breaking reaction in the photoresist in the exposure area dominates and is easily soluble in the developing solution. <\/strong><\/p><p><strong>Negative photoresist (negative adhesive): the cross-linking reaction in the photoresist in the exposure area is dominant, from small molecules cross-linked polymerization to large molecules, difficult to dissolve in the developing solution. <\/strong><\/p>\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-d763306 elementor-widget elementor-widget-image\" data-id=\"d763306\" data-element_type=\"widget\" data-widget_type=\"image.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t\t\t\t\t\t\t<img loading=\"lazy\" decoding=\"async\" width=\"1024\" height=\"847\" src=\"https:\/\/www.accscicn.com\/wp-content\/uploads\/2022\/12\/\u6b63\u80f6\u548c\u8d1f\u80f6-1024x847.jpg\" class=\"attachment-large size-large wp-image-29249\" alt=\"\" srcset=\"https:\/\/www.accscicn.com\/wp-content\/uploads\/2022\/12\/\u6b63\u80f6\u548c\u8d1f\u80f6-1024x847.jpg 1024w, https:\/\/www.accscicn.com\/wp-content\/uploads\/2022\/12\/\u6b63\u80f6\u548c\u8d1f\u80f6-300x248.jpg 300w, https:\/\/www.accscicn.com\/wp-content\/uploads\/2022\/12\/\u6b63\u80f6\u548c\u8d1f\u80f6-768x635.jpg 768w, https:\/\/www.accscicn.com\/wp-content\/uploads\/2022\/12\/\u6b63\u80f6\u548c\u8d1f\u80f6-1536x1271.jpg 1536w, https:\/\/www.accscicn.com\/wp-content\/uploads\/2022\/12\/\u6b63\u80f6\u548c\u8d1f\u80f6-2048x1695.jpg 2048w\" sizes=\"(max-width: 1024px) 100vw, 1024px\" \/>\t\t\t\t\t\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-9eac62e elementor-widget elementor-widget-heading\" data-id=\"9eac62e\" data-element_type=\"widget\" data-widget_type=\"heading.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t<h3 class=\"elementor-heading-title elementor-size-default\">Key parameters of photoresists<\/h3>\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-bac22de elementor-widget elementor-widget-text-editor\" data-id=\"bac22de\" data-element_type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t<p>Similar to UV photoresists, we usually select or evaluate a photoresist for process application by the following four parameters: sensitivity, contrast, resolution, and etch resistance.<\/p>\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-9bfcf57 elementor-widget elementor-widget-text-editor\" data-id=\"9bfcf57\" data-element_type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t<div data-page-id=\"XNWvd0Er4ogPewxzjOMcotAXn9e\" data-docx-has-block-data=\"false\"><div class=\"ace-line ace-line old-record-id-JIsydAqmQokkmWxGMFyc3r5TnUh\" style=\"font-style: inherit; font-weight: inherit;\"><ul><li><div class=\"ace-line ace-line old-record-id-P0iYdeKQWoswqgxuUKRcT9t0npg\" style=\"font-style: inherit; font-weight: inherit; display: inline !important;\"><strong>Sensitivity.<\/strong>The higher the sensitivity of the photoresist, the smaller the exposure dose (irradiation) required. The sensitivity is affected by the electron capacity keV (or acceleration voltage kV), substrate material, process conditions, developer used and other factors<\/div><\/li><li><strong>Contrast ratio.<\/strong>High contrast yields steeper sidewalls, greater processing headroom, better resolution, higher aspect ratio structure, making it less sensitive to proximity effects and higher pattern density. Low contrast is only applicable to 3D grayscale lithography<\/li><li><strong>Resolution.<\/strong>defines the size of the smallest feature that can be obtained or the minimum distance between two structures.<\/li><li><strong>Etching resistance.<\/strong>If the subsequent etching process is required, a photoresist that can maintain its integrity during chemical (wet) and physical (dry) etching should be selected.<\/li><\/ul><\/div><\/div>\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-924d6d6 elementor-widget elementor-widget-text-editor\" data-id=\"924d6d6\" data-element_type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t<p>In addition, it is necessary to consider the selection of suitable photoresist in combination with the positive and negative characteristics of photoresist, process tolerance, adhesion, thermal fluidity, expansion effect, storage life and other parameters.<\/p>\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-8906c50 elementor-widget elementor-widget-spacer\" data-id=\"8906c50\" data-element_type=\"widget\" data-widget_type=\"spacer.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t<div class=\"elementor-spacer\">\n\t\t\t<div class=\"elementor-spacer-inner\"><\/div>\n\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-e95e39e elementor-widget elementor-widget-heading\" data-id=\"e95e39e\" data-element_type=\"widget\" data-widget_type=\"heading.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t<h3 class=\"elementor-heading-title elementor-size-default\">Commonly used photoresists<\/h3>\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-194ff2f elementor-widget elementor-widget-text-editor\" data-id=\"194ff2f\" data-element_type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t<p>Different photoresists are required for different applications, and this section introduces the concentrated electron beam photoresists commonly used in experiments, including positive PMMA, ZEP-520A, AR-P 6200 (SCAR62) and negative HSQ.<\/p>\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-4027a96 elementor-widget elementor-widget-heading\" data-id=\"4027a96\" data-element_type=\"widget\" data-widget_type=\"heading.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t<h4 class=\"elementor-heading-title elementor-size-default\">PMMA (ortho-glue)<\/h4>\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-a68d2bf elementor-widget elementor-widget-text-editor\" data-id=\"a68d2bf\" data-element_type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t<p>PMMA (poly-methyl methacrylate), a polymer, also known as acrylic or plexiglass, is currently the most popular electron beam photoresist. 5%~10% PMMA powder and chlorobenzene or anisole (less toxic, 2-4%) can be fully mixed to make PMMA photoresist.<\/p>\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-9fe2eaf elementor-widget elementor-widget-text-editor\" data-id=\"9fe2eaf\" data-element_type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t<ul><li>Cheap, durable, easy to operate<\/li><li>Very high resolution and contrast<\/li><li>Low sensitivity<\/li><li><span style=\"font-style: inherit; font-weight: inherit;\">Poor dry etching resistance (good for peel lift-off, not suitable for direct etching pattern transfer)<\/span><\/li><li><span style=\"font-style: inherit; font-weight: inherit;\">The sensitivity increases as the relative molecular mass decreases, and the typical relative molecular masses of PMMA are 495 kg\/mol and 950 kg\/mo<\/span><\/li><li><span style=\"font-style: inherit; font-weight: inherit;\">\u00a0Contrast and sensitivity can be modulated by changing the ratio of MIBK in the developer mixture (MIBK:IPA). Sensitivity increases with the ratio of MIBK in the developer, while contrast increases in the opposite direction.<\/span><\/li><\/ul>\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-1d54204 elementor-widget elementor-widget-heading\" data-id=\"1d54204\" data-element_type=\"widget\" data-widget_type=\"heading.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t<h4 class=\"elementor-heading-title elementor-size-default\">Zep-520A (positive rubber)<\/h4>\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-c9c7909 elementor-widget elementor-widget-text-editor\" data-id=\"c9c7909\" data-element_type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t<p>Zep-520A, the most popular commercial photoresist, was developed by Nippon Zeon in Japan as a PMMA plus benzene ring modified adhesive consisting of a copolymer of \u03b1-chloromethacrylate and \u03b1-methylstyrene to replace PMMA.<\/p>\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-7cc1275 elementor-widget elementor-widget-text-editor\" data-id=\"7cc1275\" data-element_type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t<div data-page-id=\"XNWvd0Er4ogPewxzjOMcotAXn9e\" data-docx-has-block-data=\"false\"><ul class=\"list-bullet1\"><li class=\"ace-line ace-line old-record-id-Qea8dEo0MoogMkxmoOJcB8EEnfd\" data-list=\"bullet\"><div>High resolution and high contrast, with high resolution comparable to PMMA (10-30nm graphic structure achievable) and high contrast<\/div><\/li><li class=\"ace-line ace-line old-record-id-KKgud6s0Wo6SyIx0uLscy7cXnbe\" data-list=\"bullet\"><div>High sensitivity, with PMMA higher sensitivity (3~5 times)<\/div><\/li><li class=\"ace-line ace-line old-record-id-QSAIduswMosq8kx6rgFcFe7Cn4d\" data-list=\"bullet\"><div>High dry etching resistance, more than 5 times compared to PMMA.<\/div><\/li><li class=\"ace-line ace-line old-record-id-Tw6YdMGW4okQSOx8rz6cOrsEn9f\" data-list=\"bullet\"><div>Expensive, with a one-year shelf life.<\/div><\/li><li class=\"ace-line ace-line old-record-id-P8EUd8iQIoOs4ExWKsYcPajxnTd\" data-list=\"bullet\"><div>For ultra-high sorting rates (sub-10nm), it may be better to use PMMA.<\/div><\/li><li class=\"ace-line ace-line old-record-id-FqeQd6eygo2mWMxcbsdc4EDwnRf\" data-list=\"bullet\"><div>ZEP-520A is not easy to remove after exposure, development and baking of firm film, usually ZDMAC is used to remove glue<\/div><\/li><\/ul><\/div>\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-6ff5f9b elementor-widget elementor-widget-heading\" data-id=\"6ff5f9b\" data-element_type=\"widget\" data-widget_type=\"heading.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t<h4 class=\"elementor-heading-title elementor-size-default\">AR-P 6200 (CSAR62) (positive rubber)<\/h4>\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-d278dfb elementor-widget elementor-widget-text-editor\" data-id=\"d278dfb\" data-element_type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t<div data-page-id=\"XNWvd0Er4ogPewxzjOMcotAXn9e\" data-docx-has-block-data=\"false\"><ul class=\"list-bullet1\"><li class=\"ace-line ace-line old-record-id-GcwQd6kaKouwYAxg3Sjcd8denQc\" data-list=\"bullet\"><div>Ultra-high resolution (&lt;10nm)<\/div><\/li><li class=\"ace-line ace-line old-record-id-CYQ0duUgQoyaCUx8I8ccwWNBnjb\" data-list=\"bullet\"><div>High sensitivity, sensitivity can be adjusted by selecting the appropriate developer.<\/div><\/li><li class=\"ace-line ace-line old-record-id-Dc8adIuCGoEEmKxKr4ecbY0OnY2\" data-list=\"bullet\"><div>High contrast ratio (&gt;15)<\/div><\/li><li class=\"ace-line ace-line old-record-id-QKscd4IaEoeg0qxIFtXcmrCYn8e\" data-list=\"bullet\"><div>High depth to width ratio (up to 20:1)<\/div><\/li><li class=\"ace-line ace-line old-record-id-TQoqdKg2IoEKIMx8PVdcmXJPnbh\" data-list=\"bullet\"><div>Good process stability and resistance to dry etching, which is twice that of PMMA.<\/div><\/li><li class=\"ace-line ace-line old-record-id-Sq8IdowKaoGyKkx4eU2c9LNBnkd\" data-list=\"bullet\"><div>Good adhesion with the substrate, not easy to occur the phenomenon of debonding and cracking.<\/div><\/li><li class=\"ace-line ace-line old-record-id-TcIYdWC6KoSEiixGGT2ckOoCn9b\" data-list=\"bullet\"><div>Low Young's modulus, prone to collapse, adhesion and overturning.<\/div><\/li><li class=\"ace-line ace-line old-record-id-N26SdcUiOomiUix2p01c6rmenAh\" data-list=\"bullet\"><div>Lower melting point, which produces resist melting.<\/div><\/li><li class=\"ace-line ace-line old-record-id-VYAudsGcWoE0SCxQkCZc435cnsb\" data-list=\"bullet\"><div>Graphical surfaces are prone to shrinkage<\/div><\/li><\/ul><\/div>\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-3ee851f elementor-widget elementor-widget-heading\" data-id=\"3ee851f\" data-element_type=\"widget\" data-widget_type=\"heading.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t<h4 class=\"elementor-heading-title elementor-size-default\">HSQ (negative glue)<\/h4>\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-a3b4629 elementor-widget elementor-widget-text-editor\" data-id=\"a3b4629\" data-element_type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t<div data-page-id=\"XNWvd0Er4ogPewxzjOMcotAXn9e\" data-docx-has-block-data=\"false\"><div class=\"ace-line ace-line old-record-id-SmeGdOWOuoMMGsxcbIJcc92Hnpg\">HSQ, developed by Dow Corning, is an inorganic silica-based compound composed of hydrogen silsesquioxane (HSQ) resins in a methylisobutylketone (MIBK) carrier solvent.<\/div><\/div>\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-4910efa elementor-widget elementor-widget-text-editor\" data-id=\"4910efa\" data-element_type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t<div data-page-id=\"XNWvd0Er4ogPewxzjOMcotAXn9e\" data-docx-has-block-data=\"false\"><ul class=\"list-bullet1\"><li class=\"ace-line ace-line old-record-id-KeIEduKgyo28q8xYpNic3Ui2nSf\" data-list=\"bullet\"><div>Very high resolution (&lt;10nm)<\/div><\/li><li class=\"ace-line ace-line old-record-id-QgscdOCK8osGMixYvK0cLW2Hnsd\" data-list=\"bullet\"><div>Low sensitivity and long exposure times.<\/div><\/li><li class=\"ace-line ace-line old-record-id-AeQUdcIiOoIMW6xm42Nc6RzVnLc\" data-list=\"bullet\"><div>Development by chemical reaction (reaction of unexposed HSQ with diluted NH4OH or NaOH developer to produce H2), not by dissolution, with good process stability after development.<\/div><\/li><li class=\"ace-line ace-line old-record-id-K6WGdWGAsoquuMxSC7Kc5bbknKg\" data-list=\"bullet\"><div>Good performance in electron microscopy observation without gold plating.<\/div><\/li><li class=\"ace-line ace-line old-record-id-QCuIdQw4WoAq4Wx8n9icmmmYnPe\" data-list=\"bullet\"><div>A good mask material for etching silicon.<\/div><\/li><li class=\"ace-line ace-line old-record-id-GiCedkgyGowgWAx2p28cW3Fannf\" data-list=\"bullet\"><div>The shelf life is short, with a storage period of only 6 months. HSQ (H-SiOx) in powder form will have a longer shelf life<\/div><\/li><li class=\"ace-line ace-line old-record-id-MSiedyCWwoO0agxclitcXTTznJb\" data-list=\"bullet\"><div>Storage conditions are harsh, the gel is easily oxidized when exposed to air, and the phenomenon of jelly curing occurs, which requires low temperature (5\u2103) sealed storage.<\/div><\/li><li class=\"ace-line ace-line old-record-id-Ckwcdk4UYoYwGaxUBM0ceKIKnlr\" data-list=\"bullet\"><div>Very high contrast, easy preparation of structures with steep and straight profiles and high aspect ratios.<\/div><\/li><li class=\"ace-line ace-line old-record-id-MIkwdcqC0oOcuqxA7RhcJ0aqnSc\" data-list=\"bullet\"><div>A stretchable photoresist with good verticality of line edges after development.<\/div><\/li><li class=\"ace-line ace-line old-record-id-OGoadciKyoYuqSx0mLDcnWZGnQc\" data-list=\"bullet\"><div>Good adhesion, toughness and non-breakability.<\/div><\/li><\/ul><\/div>\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-9d6770e elementor-widget elementor-widget-heading\" data-id=\"9d6770e\" data-element_type=\"widget\" data-widget_type=\"heading.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t<h2 class=\"elementor-heading-title elementor-size-default\">Proximity effect<\/h2>\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-6df3577 elementor-widget elementor-widget-text-editor\" data-id=\"6df3577\" data-element_type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t<p>The proximity effect of electron beam exposure, is when two exposure patterns are close to each other, due to the scattering of electrons in the photoresist and substrate so that the electrons deviate from the original direction of incidence, resulting in the original should not be exposed to the neighboring areas were exposed, and some should be exposed to the region and not enough exposure, resulting in distortion of the exposure pattern. Bring contrast reduction, resolution degradation and other problems.<\/p>\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-820b2ce elementor-widget elementor-widget-heading\" data-id=\"820b2ce\" data-element_type=\"widget\" data-widget_type=\"heading.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t<h3 class=\"elementor-heading-title elementor-size-default\">Correction method<\/h3>\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-d2b02a7 elementor-widget elementor-widget-text-editor\" data-id=\"d2b02a7\" data-element_type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t<div data-page-id=\"XNWvd0Er4ogPewxzjOMcotAXn9e\" data-docx-has-block-data=\"false\"><div><b>Proximity effect correction has three methods: \u2460 dose correction \u2461 graphic size compensation \u2462 background exposure compensation<\/b><\/div><div><b>\u00a0<\/b><\/div><ul><li data-list=\"bullet\"><div><b>Dose correction<\/b>The most common application, the best results of a method, the principle is to make all the exposure of artificial graphics are uniform and consistent exposure energy.<b>The dose correction is also divided into: self-consistent technique (physical correction) and geometric cut method.<\/b><span style=\"font-style: inherit;\">Self-consistent technology (physical correction)<span style=\"font-weight: inherit;\">: relatively accurate, but computationally intensive for large-scale integrated circuit designs.<\/span><\/span><span style=\"font-style: inherit; font-weight: inherit;\">Geometric cut method: the calculated exposure dose distribution is coarse, but the calculation is very fast.<\/span><\/div><\/li><li data-list=\"bullet\"><div><b>Graphic size compensation<\/b>It compensates for the effects of too high or too low local energy by reducing or increasing the size of each graph, and is suitable for graphs with simple cycle repetition.<\/div><\/li><\/ul><\/div>\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-d283c30 elementor-widget elementor-widget-image\" data-id=\"d283c30\" data-element_type=\"widget\" data-widget_type=\"image.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t\t\t\t\t\t\t<img loading=\"lazy\" decoding=\"async\" width=\"995\" height=\"683\" src=\"https:\/\/www.accscicn.com\/wp-content\/uploads\/2022\/12\/\u90bb\u8fd1\u6548\u5e94\u6821\u6b63\u6548\u679c\u5bf9\u6bd4-1.jpg\" class=\"attachment-large size-large wp-image-29251\" alt=\"\" srcset=\"https:\/\/www.accscicn.com\/wp-content\/uploads\/2022\/12\/\u90bb\u8fd1\u6548\u5e94\u6821\u6b63\u6548\u679c\u5bf9\u6bd4-1.jpg 995w, https:\/\/www.accscicn.com\/wp-content\/uploads\/2022\/12\/\u90bb\u8fd1\u6548\u5e94\u6821\u6b63\u6548\u679c\u5bf9\u6bd4-1-300x206.jpg 300w, https:\/\/www.accscicn.com\/wp-content\/uploads\/2022\/12\/\u90bb\u8fd1\u6548\u5e94\u6821\u6b63\u6548\u679c\u5bf9\u6bd4-1-768x527.jpg 768w\" sizes=\"(max-width: 995px) 100vw, 995px\" \/>\t\t\t\t\t\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-0e744e1 elementor-widget elementor-widget-text-editor\" data-id=\"0e744e1\" data-element_type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t<div data-page-id=\"XNWvd0Er4ogPewxzjOMcotAXn9e\" data-docx-has-block-data=\"false\"><ul><li data-list=\"bullet\"><div><p><b>Background Exposure Compensation<\/b>The second exposure energy superimposed so that the energy distribution in all parts of the equalization, without the need to calculate the energy distribution, but may make the contrast of the exposure of the image is reduced, suitable for raster scanning exposure system.<\/p><\/div><\/li><\/ul><\/div>\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-c1dfb83 elementor-widget elementor-widget-text-editor\" data-id=\"c1dfb83\" data-element_type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t<p><strong>The simplest and most effective way to reduce the proximity effect is to increase the electron beam energy and reduce the thickness of the electron beam photoresist.<\/strong>However, it should be considered that high electron beam energy may cause damage and overheating to the substrate.<\/p>\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-cb5c2a0 elementor-widget elementor-widget-image\" data-id=\"cb5c2a0\" data-element_type=\"widget\" data-widget_type=\"image.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t\t\t\t\t\t\t<img loading=\"lazy\" decoding=\"async\" width=\"925\" height=\"925\" src=\"https:\/\/www.accscicn.com\/wp-content\/uploads\/2022\/12\/\u4e0d\u540c\u7535\u5b50\u80fd\u91cf\u5728\u7845\u6676\u7247\u4e0a\u7684\u7535\u5b50\u8f68\u8ff9.jpg\" class=\"attachment-large size-large wp-image-29253\" alt=\"\" srcset=\"https:\/\/www.accscicn.com\/wp-content\/uploads\/2022\/12\/\u4e0d\u540c\u7535\u5b50\u80fd\u91cf\u5728\u7845\u6676\u7247\u4e0a\u7684\u7535\u5b50\u8f68\u8ff9.jpg 925w, https:\/\/www.accscicn.com\/wp-content\/uploads\/2022\/12\/\u4e0d\u540c\u7535\u5b50\u80fd\u91cf\u5728\u7845\u6676\u7247\u4e0a\u7684\u7535\u5b50\u8f68\u8ff9-300x300.jpg 300w, https:\/\/www.accscicn.com\/wp-content\/uploads\/2022\/12\/\u4e0d\u540c\u7535\u5b50\u80fd\u91cf\u5728\u7845\u6676\u7247\u4e0a\u7684\u7535\u5b50\u8f68\u8ff9-150x150.jpg 150w, https:\/\/www.accscicn.com\/wp-content\/uploads\/2022\/12\/\u4e0d\u540c\u7535\u5b50\u80fd\u91cf\u5728\u7845\u6676\u7247\u4e0a\u7684\u7535\u5b50\u8f68\u8ff9-768x768.jpg 768w\" sizes=\"(max-width: 925px) 100vw, 925px\" \/>\t\t\t\t\t\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-560722b elementor-widget elementor-widget-heading\" data-id=\"560722b\" data-element_type=\"widget\" data-widget_type=\"heading.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t<h2 class=\"elementor-heading-title elementor-size-default\">Applications<\/h2>\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-b3a16e5 elementor-widget elementor-widget-text-editor\" data-id=\"b3a16e5\" data-element_type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t<p>High-precision mask: Electron beam lithography has a wide range of applications in the field of high-precision mask manufacturing for integrated circuits due to its high resolution and direct writing type.\u00a0<\/p><p>Optoelectronic field, such as electronic and optoelectronic chip prototyping and small batch production, diffraction grating, binary optics, micro and nano optics (micro lens array, optical waveguide) and super surface lens and other industries of small batch production, special optoelectronic devices customization.<\/p>\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-bafc88b elementor-widget elementor-widget-image\" data-id=\"bafc88b\" data-element_type=\"widget\" data-widget_type=\"image.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t\t\t\t\t\t\t<img loading=\"lazy\" decoding=\"async\" width=\"1024\" height=\"819\" src=\"https:\/\/www.accscicn.com\/wp-content\/uploads\/2022\/12\/\u8d85\u900f\u955c-1024x819.jpg\" class=\"attachment-large size-large wp-image-29254\" alt=\"\" srcset=\"https:\/\/www.accscicn.com\/wp-content\/uploads\/2022\/12\/\u8d85\u900f\u955c-1024x819.jpg 1024w, https:\/\/www.accscicn.com\/wp-content\/uploads\/2022\/12\/\u8d85\u900f\u955c-300x240.jpg 300w, https:\/\/www.accscicn.com\/wp-content\/uploads\/2022\/12\/\u8d85\u900f\u955c-768x614.jpg 768w, https:\/\/www.accscicn.com\/wp-content\/uploads\/2022\/12\/\u8d85\u900f\u955c.jpg 1280w\" sizes=\"(max-width: 1024px) 100vw, 1024px\" \/>\t\t\t\t\t\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-aa93354 elementor-widget elementor-widget-spacer\" data-id=\"aa93354\" data-element_type=\"widget\" data-widget_type=\"spacer.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t<div class=\"elementor-spacer\">\n\t\t\t<div class=\"elementor-spacer-inner\"><\/div>\n\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-fc744bd elementor-widget elementor-widget-text-editor\" data-id=\"fc744bd\" data-element_type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t<p>We offer <a href=\"https:\/\/www.accscicn.com\/en\/nanofabrication\/fabrication-lithography\/\" target=\"_blank\" rel=\"noopener\"><b>Electron beam lithography \/ micro and nanostructure processing design services<\/b><\/a>, Feel free to leave a message to inquire.<\/p>\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-ed26017 elementor-widget elementor-widget-wpforms\" data-id=\"ed26017\" data-element_type=\"widget\" data-widget_type=\"wpforms.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t<div class=\"wpforms-container wpforms-container-full\" id=\"wpforms-26998\"><form id=\"wpforms-form-26998\" class=\"wpforms-validate wpforms-form wpforms-ajax-form\" data-formid=\"26998\" method=\"post\" enctype=\"multipart\/form-data\" action=\"\/en\/wp-json\/wp\/v2\/posts\/29236\" data-token=\"3546b1565cb0949df1639e3b25e98dd4\" data-trp-original-action=\"\/en\/wp-json\/wp\/v2\/posts\/29236\"><noscript class=\"wpforms-error-noscript\">Please 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srcset=\"https:\/\/www.accscicn.com\/wp-content\/uploads\/2024\/05\/\u5fae\u900f\u955c\u9635\u5217-300x259.png 300w, https:\/\/www.accscicn.com\/wp-content\/uploads\/2024\/05\/\u5fae\u900f\u955c\u9635\u5217-14x12.png 14w, https:\/\/www.accscicn.com\/wp-content\/uploads\/2024\/05\/\u5fae\u900f\u955c\u9635\u5217.png 434w\" sizes=\"(max-width: 300px) 100vw, 300px\" \/><\/div>\n\t\t<\/a>\n\t\t\t\t<div class=\"elementor-post__text\">\n\t\t\t\t<h3 class=\"elementor-post__title\">\n\t\t\t<a href=\"https:\/\/www.accscicn.com\/en\/product\/2pp-two-photon-polymerization\/\" >\n\t\t\t\tHigh-precision two-photon polymerization 3D printing system\t\t\t<\/a>\n\t\t<\/h3>\n\t\t\n\t\t<a class=\"elementor-post__read-more\" href=\"https:\/\/www.accscicn.com\/en\/product\/2pp-two-photon-polymerization\/\" aria-label=\"Read more about High-Precision Two-photon Polymerization 3D Printing System\" tabindex=\"-1\" >\n\t\t\tRead More \"\t\t<\/a>\n\n\t\t\t\t<\/div>\n\t\t\t\t<\/article>\n\t\t\t\t<article class=\"elementor-post elementor-grid-item post-27555 page type-page status-publish has-post-thumbnail hentry category-nanofabrication tag-nanofabrication\">\n\t\t\t\t<a class=\"elementor-post__thumbnail__link\" href=\"https:\/\/www.accscicn.com\/en\/nanofabrication\/fabrication-coating\/\" tabindex=\"-1\" >\n\t\t\t<div class=\"elementor-post__thumbnail\"><img loading=\"lazy\" decoding=\"async\" width=\"300\" height=\"228\" src=\"https:\/\/www.accscicn.com\/wp-content\/uploads\/2022\/11\/cadence-comparison-\u78c1\u63a7\u6e85\u5c04\u9540\u819c-1-300x228.jpg\" class=\"attachment-medium size-medium wp-image-28958\" alt=\"\" srcset=\"https:\/\/www.accscicn.com\/wp-content\/uploads\/2022\/11\/cadence-comparison-\u78c1\u63a7\u6e85\u5c04\u9540\u819c-1-300x228.jpg 300w, https:\/\/www.accscicn.com\/wp-content\/uploads\/2022\/11\/cadence-comparison-\u78c1\u63a7\u6e85\u5c04\u9540\u819c-1.jpg 625w\" sizes=\"(max-width: 300px) 100vw, 300px\" \/><\/div>\n\t\t<\/a>\n\t\t\t\t<div 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