1.0https://www.accscicn.com/esrich600338<blockquote class="wp-embedded-content" data-secret="IJIUvYXN4U"><a href="https://www.accscicn.com/es/nanofabricacion/sub_nanofab_01/">Procesado litográfico de microestructuras y nanoestructuras Deposición de películas finas Grabado en seco Galvanoplastia Difusión de óxidos</a></blockquote><iframe sandbox="allow-scripts" security="restricted" src="https://www.accscicn.com/es/nanofabricacion/sub_nanofab_01/embed/#?secret=IJIUvYXN4U" width="600" height="338" title="«光刻微纳结构加工 薄膜沉积 干法刻蚀 电镀 氧化扩散» — " data-secret="IJIUvYXN4U" frameborder="0" marginwidth="0" marginheight="0" scrolling="no" class="wp-embedded-content"></iframe><script> /*! This file is auto-generated */ !function(d,l){"use strict";l.querySelector&&d.addEventListener&&"undefined"!=typeof URL&&(d.wp=d.wp||{},d.wp.receiveEmbedMessage||(d.wp.receiveEmbedMessage=function(e){var t=e.data;if((t||t.secret||t.message||t.value)&&!/[^a-zA-Z0-9]/.test(t.secret)){for(var s,r,n,a=l.querySelectorAll('iframe[data-secret="'+t.secret+'"]'),o=l.querySelectorAll('blockquote[data-secret="'+t.secret+'"]'),c=new RegExp("^https?:$","i"),i=0;i<o.length;i++)o[i].style.display="none";for(i=0;i<a.length;i++)s=a[i],e.source===s.contentWindow&&(s.removeAttribute("style"),"height"===t.message?(1e3<(r=parseInt(t.value,10))?r=1e3:~~r<200&&(r=200),s.height=r):"link"===t.message&&(r=new URL(s.getAttribute("src")),n=new URL(t.value),c.test(n.protocol))&&n.host===r.host&&l.activeElement===s&&(d.top.location.href=t.value))}},d.addEventListener("message",d.wp.receiveEmbedMessage,!1),l.addEventListener("DOMContentLoaded",function(){for(var e,t,s=l.querySelectorAll("iframe.wp-embedded-content"),r=0;r<s.length;r++)(t=(e=s[r]).getAttribute("data-secret"))||(t=Math.random().toString(36).substring(2,12),e.src+="#?secret="+t,e.setAttribute("data-secret",t)),e.contentWindow.postMessage({message:"ready",secret:t},"*")},!1)))}(window,document); //# sourceURL=https://www.accscicn.com/wp-includes/js/wp-embed.min.js </script>https://www.accscicn.com/wp-content/uploads/2022/08/Bearbeitet-10-525x700-1.jpg525700拥有电子束曝光系统、双束聚焦离子束系统、双面对准紫外光刻机、热压/紫外纳米压印系统、涂胶显影系统、微波去胶机、氧化扩散炉、多晶硅/氮化硅LPCVD炉、快速热处理设备、湿法清洗刻蚀台、多靶磁控溅射系统、超高真空磁控溅射系统、电子束蒸发设备、离子束溅射机、离子束刻蚀机、等离子增强化学气相沉积设备、金属反应离子刻蚀设备、介质反应离子刻蚀设备、深硅刻蚀系统、微电铸/电镀系统等先进的微纳加工与测试设备，具备10nm至微米级微纳器件与图形的加工与测试能力。