{"id":29236,"date":"2022-12-15T11:31:20","date_gmt":"2022-12-15T03:31:20","guid":{"rendered":"https:\/\/www.accscicn.com\/?p=29236"},"modified":"2023-06-08T18:24:03","modified_gmt":"2023-06-08T10:24:03","slug":"what-is-electron-beam-lithography","status":"publish","type":"post","link":"https:\/\/www.accscicn.com\/es\/soluciones\/que-es-la-litografia-por-haz-de-electrones\/","title":{"rendered":"Introducci\u00f3n a la litograf\u00eda por haz de electrones (EBL)"},"content":{"rendered":"<div data-elementor-type=\"wp-post\" data-elementor-id=\"29236\" class=\"elementor elementor-29236\" data-elementor-post-type=\"post\">\n\t\t\t\t\t\t<section class=\"elementor-section elementor-top-section elementor-element elementor-element-7eb15ef elementor-section-stretched elementor-section-boxed elementor-section-height-default elementor-section-height-default\" data-id=\"7eb15ef\" data-element_type=\"section\" data-settings=\"{&quot;stretch_section&quot;:&quot;section-stretched&quot;}\">\n\t\t\t\t\t\t<div class=\"elementor-container elementor-column-gap-default\">\n\t\t\t\t\t<div class=\"elementor-column elementor-col-50 elementor-top-column elementor-element elementor-element-70e1828\" data-id=\"70e1828\" data-element_type=\"column\">\n\t\t\t<div class=\"elementor-widget-wrap elementor-element-populated\">\n\t\t\t\t\t\t<div class=\"elementor-element elementor-element-8821e50 elementor-widget elementor-widget-heading\" data-id=\"8821e50\" data-element_type=\"widget\" data-widget_type=\"heading.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t<style>\/*! elementor - v3.21.0 - 20-05-2024 *\/\n.elementor-heading-title{padding:0;margin:0;line-height:1}.elementor-widget-heading .elementor-heading-title[class*=elementor-size-]>a{color:inherit;font-size:inherit;line-height:inherit}.elementor-widget-heading .elementor-heading-title.elementor-size-small{font-size:15px}.elementor-widget-heading .elementor-heading-title.elementor-size-medium{font-size:19px}.elementor-widget-heading .elementor-heading-title.elementor-size-large{font-size:29px}.elementor-widget-heading .elementor-heading-title.elementor-size-xl{font-size:39px}.elementor-widget-heading .elementor-heading-title.elementor-size-xxl{font-size:59px}<\/style><h1 class=\"elementor-heading-title elementor-size-default\">Introducci\u00f3n a la litograf\u00eda por haz de electrones (EBL)<\/h1>\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-5b4a554 elementor-toc--minimized-on-tablet elementor-widget elementor-widget-table-of-contents\" data-id=\"5b4a554\" data-element_type=\"widget\" data-settings=\"{&quot;headings_by_tags&quot;:[&quot;h2&quot;],&quot;exclude_headings_by_selector&quot;:[],&quot;marker_view&quot;:&quot;numbers&quot;,&quot;minimize_box&quot;:&quot;yes&quot;,&quot;minimized_on&quot;:&quot;tablet&quot;,&quot;hierarchical_view&quot;:&quot;yes&quot;,&quot;min_height&quot;:{&quot;unit&quot;:&quot;px&quot;,&quot;size&quot;:&quot;&quot;,&quot;sizes&quot;:[]},&quot;min_height_tablet&quot;:{&quot;unit&quot;:&quot;px&quot;,&quot;size&quot;:&quot;&quot;,&quot;sizes&quot;:[]},&quot;min_height_mobile&quot;:{&quot;unit&quot;:&quot;px&quot;,&quot;size&quot;:&quot;&quot;,&quot;sizes&quot;:[]}}\" data-widget_type=\"table-of-contents.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t<style>\/*! elementor-pro - v3.21.0 - 30-04-2024 *\/\n.elementor-widget-table-of-contents .elementor-toc__header-title{color:var(--header-color)}.elementor-widget-table-of-contents.elementor-toc--collapsed 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i{font-size:var(--marker-size,.5em)}.elementor-toc__list-item-text-wrapper:before{font-size:var(--marker-size,1em)}.elementor-toc--content-ellipsis .elementor-toc__list-item-text{white-space:nowrap;overflow:hidden;text-overflow:ellipsis}.elementor-toc__list-items--collapsible>.elementor-toc__list-wrapper>.elementor-toc__list-item>.elementor-toc__list-wrapper{display:none}.elementor-toc__heading-anchor{position:absolute}.elementor-toc__body .elementor-toc__list-item-text{color:var(--item-text-color);-webkit-text-decoration:var(--item-text-decoration);text-decoration:var(--item-text-decoration);transition-duration:var(--item-text-transition-duration)}.elementor-toc__body .elementor-toc__list-item-text:hover{color:var(--item-text-hover-color);-webkit-text-decoration:var(--item-text-hover-decoration);text-decoration:var(--item-text-hover-decoration)}.elementor-toc__body .elementor-toc__list-item-text.elementor-item-active{color:var(--item-text-active-color);-webkit-text-decoration:var(--item-text-active-decoration);text-decoration:var(--item-text-active-decoration)}ol.elementor-toc__list-wrapper{counter-reset:item}ol.elementor-toc__list-wrapper .elementor-toc__list-item{counter-increment:item}ol.elementor-toc__list-wrapper .elementor-toc__list-item-text-wrapper:before{content:counters(item,\".\") \". \"}<\/style>\t\t<div class=\"elementor-toc__header\">\n\t\t\t<div class=\"elementor-toc__header-title\">\n\t\t\t\tCat\u00e1logo\t\t\t<\/div>\n\t\t\t\t\t\t\t<div class=\"elementor-toc__toggle-button elementor-toc__toggle-button--expand\" role=\"button\" tabindex=\"0\" aria-controls=\"elementor-toc__5b4a554\" aria-expanded=\"true\" aria-label=\"Abrir la tabla de contenidos\"><i aria-hidden=\"true\" class=\"fas fa-chevron-down\"><\/i><\/div>\n\t\t\t\t<div class=\"elementor-toc__toggle-button elementor-toc__toggle-button--collapse\" role=\"button\" tabindex=\"0\" aria-controls=\"elementor-toc__5b4a554\" aria-expanded=\"true\" aria-label=\"Cerrar la tabla de contenidos\"><i aria-hidden=\"true\" class=\"fas fa-chevron-up\"><\/i><\/div>\n\t\t\t\t\t<\/div>\n\t\t<div id=\"elementor-toc__5b4a554\" class=\"elementor-toc__body\">\n\t\t\t<div class=\"elementor-toc__spinner-container\">\n\t\t\t\t<i class=\"elementor-toc__spinner eicon-animation-spin eicon-loading\" aria-hidden=\"true\"><\/i>\t\t\t<\/div>\n\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-092599b elementor-widget elementor-widget-heading\" data-id=\"092599b\" data-element_type=\"widget\" data-widget_type=\"heading.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t<h2 class=\"elementor-heading-title elementor-size-default\">\u00bfQu\u00e9 es la litograf\u00eda por haz de electrones?<\/h2>\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-852229a elementor-widget elementor-widget-text-editor\" data-id=\"852229a\" data-element_type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t<style>\/*! elementor - v3.21.0 - 20-05-2024 *\/\n.elementor-widget-text-editor.elementor-drop-cap-view-stacked .elementor-drop-cap{background-color:#69727d;color:#fff}.elementor-widget-text-editor.elementor-drop-cap-view-framed .elementor-drop-cap{color:#69727d;border:3px solid;background-color:transparent}.elementor-widget-text-editor:not(.elementor-drop-cap-view-default) .elementor-drop-cap{margin-top:8px}.elementor-widget-text-editor:not(.elementor-drop-cap-view-default) .elementor-drop-cap-letter{width:1em;height:1em}.elementor-widget-text-editor .elementor-drop-cap{float:left;text-align:center;line-height:1;font-size:50px}.elementor-widget-text-editor .elementor-drop-cap-letter{display:inline-block}<\/style>\t\t\t\t<p style=\"font-size: 18px; font-style: normal; font-weight: 300; color: #000000;\">La litograf\u00eda por haz de electrones (e-beam lithography; EBL) es un tipo de litograf\u00eda sin m\u00e1scara que utiliza electrones focalizados de longitudes de onda extremadamente cortas para actuar directamente sobre la superficie de un fotorresistente sensible a los electrones (resist) y formar una micro y nanoestructura que coincida con el patr\u00f3n dise\u00f1ado. Los sistemas EBL tienen las ventajas de la resoluci\u00f3n ultraalta (transferencia gr\u00e1fica con un tama\u00f1o l\u00edmite de &lt;10nm) y el patronaje flexible (escritura directa sin m\u00e1scara), pero debido a la baja eficacia de la exposici\u00f3n y al complejo control, la EBL se utiliza m\u00e1s com\u00fanmente para m\u00e1scaras litogr\u00e1ficas, prototipos de principios avanzados e investigaci\u00f3n y desarrollo cient\u00edficos a nanoescala.<\/p>\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-065bf11 elementor-widget elementor-widget-spacer\" data-id=\"065bf11\" data-element_type=\"widget\" data-widget_type=\"spacer.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t<style>\/*! elementor - v3.21.0 - 20-05-2024 *\/\n.elementor-column .elementor-spacer-inner{height:var(--spacer-size)}.e-con{--container-widget-width:100%}.e-con-inner>.elementor-widget-spacer,.e-con>.elementor-widget-spacer{width:var(--container-widget-width,var(--spacer-size));--align-self:var(--container-widget-align-self,initial);--flex-shrink:0}.e-con-inner>.elementor-widget-spacer>.elementor-widget-container,.e-con>.elementor-widget-spacer>.elementor-widget-container{height:100%;width:100%}.e-con-inner>.elementor-widget-spacer>.elementor-widget-container>.elementor-spacer,.e-con>.elementor-widget-spacer>.elementor-widget-container>.elementor-spacer{height:100%}.e-con-inner>.elementor-widget-spacer>.elementor-widget-container>.elementor-spacer>.elementor-spacer-inner,.e-con>.elementor-widget-spacer>.elementor-widget-container>.elementor-spacer>.elementor-spacer-inner{height:var(--container-widget-height,var(--spacer-size))}.e-con-inner>.elementor-widget-spacer.elementor-widget-empty,.e-con>.elementor-widget-spacer.elementor-widget-empty{position:relative;min-height:22px;min-width:22px}.e-con-inner>.elementor-widget-spacer.elementor-widget-empty .elementor-widget-empty-icon,.e-con>.elementor-widget-spacer.elementor-widget-empty .elementor-widget-empty-icon{position:absolute;top:0;bottom:0;left:0;right:0;margin:auto;padding:0;width:22px;height:22px}<\/style>\t\t<div class=\"elementor-spacer\">\n\t\t\t<div class=\"elementor-spacer-inner\"><\/div>\n\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-5ce1adb elementor-widget elementor-widget-heading\" data-id=\"5ce1adb\" data-element_type=\"widget\" data-widget_type=\"heading.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t<h2 class=\"elementor-heading-title elementor-size-default\">Historia del desarrollo<\/h2>\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-8ab00fa elementor-widget elementor-widget-text-editor\" data-id=\"8ab00fa\" data-element_type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t<div data-page-id=\"UGy9d0v5UoJAVxxcSQFcybhsnwb\" data-docx-has-block-data=\"false\"><div class=\"ace-line ace-line old-record-id-MCIKdoCekoKWOIxWKqncpINunlf\">El coraz\u00f3n de un sistema de litograf\u00eda por haz de electrones es el haz de electrones focalizado, y el uso de haces de electrones focalizados existe desde principios del siglo XX, siendo las primeras aplicaciones el uso de tubos de rayos cat\u00f3dicos en pantallas, y luego la llegada de los microscopios electr\u00f3nicos de barrido en la d\u00e9cada de 1960, cuya estructura ya no es fundamentalmente diferente de la de una m\u00e1quina de exposici\u00f3n por haz de electrones. Pero el uso de la exposici\u00f3n focalizada por haz de electrones para producir patrones finos comenz\u00f3 con la aparici\u00f3n de las fotorresistencias (resistivos) por haz de electrones. La litograf\u00eda por haz de electrones lleva desarroll\u00e1ndose m\u00e1s de 60 a\u00f1os, y lo ha hecho casi simult\u00e1neamente con la exposici\u00f3n \u00f3ptica, con los siguientes hitos importantes en el tiempo:<\/div><\/div>\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-778fc74 elementor-widget elementor-widget-text-editor\" data-id=\"778fc74\" data-element_type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t<div data-page-id=\"XNWvd0Er4ogPewxzjOMcotAXn9e\" data-docx-has-block-data=\"false\"><ul class=\"list-bullet1\"><li class=\"ace-line ace-line old-record-id-RUwWdmayQok2IgxwTjCcqPlhn9e\" data-list=\"bullet\"><div>Primer uso de la contaminaci\u00f3n por carbono inducida por electrones para formar una m\u00e1scara de grabado con el fin de producir una estructura gr\u00e1fica bidimensional de alta resoluci\u00f3n por investigadores del MIT en 1958.<\/div><\/li><li class=\"ace-line ace-line old-record-id-NOOMdmeACoiSwux8TJjcYgbznNd\" data-list=\"bullet\"><div>Desde 1965 se utilizan haces de electrones para producir estructuras de 100 nm.<\/div><\/li><li class=\"ace-line ace-line old-record-id-YQWEdu0keoGeGex8dYIcFrSGnjh\" data-list=\"bullet\"><div>1968 El PMMA se utiliza como fotorresistente de haz de electrones<\/div><\/li><li class=\"ace-line ace-line old-record-id-C2y2dyAY6ookokxt1tscnm3rnsI\" data-list=\"bullet\"><div>1970 Dispositivo de ondas sonoras superficiales de 0,15 um fabricado con PMMA<\/div><\/li><li class=\"ace-line ace-line old-record-id-EEisdCQiQoCOSqx4rQicbkVin2g\" data-list=\"bullet\"><div>1972: L\u00edneas met\u00e1licas de aluminio de 60x60nm con secci\u00f3n transversal sobre superficie de silicio mediante litograf\u00eda por haz de electrones<\/div><\/li><\/ul><\/div>\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-806e66f elementor-widget elementor-widget-text-editor\" data-id=\"806e66f\" data-element_type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t<p>En la d\u00e9cada de 1980 se cre\u00eda que la exposici\u00f3n \u00f3ptica hab\u00eda llegado a su fin y que la litograf\u00eda por haz de electrones era la alternativa m\u00e1s prometedora. Sin embargo, m\u00e1s de 30 a\u00f1os despu\u00e9s, la litograf\u00eda por haz de electrones sigue sin sustituir a la exposici\u00f3n \u00f3ptica. En el desarrollo de las dos tecnolog\u00edas litogr\u00e1ficas ha ido surgiendo gradualmente un patr\u00f3n complementario y se cree que este patr\u00f3n se mantendr\u00e1 durante mucho tiempo.<\/p>\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-f76c920 elementor-widget elementor-widget-spacer\" data-id=\"f76c920\" data-element_type=\"widget\" data-widget_type=\"spacer.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t<div class=\"elementor-spacer\">\n\t\t\t<div class=\"elementor-spacer-inner\"><\/div>\n\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-6dc7543 elementor-widget elementor-widget-heading\" data-id=\"6dc7543\" data-element_type=\"widget\" data-widget_type=\"heading.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t<h2 class=\"elementor-heading-title elementor-size-default\">Fundamentos te\u00f3ricos<\/h2>\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-ad66ac6 elementor-widget elementor-widget-text-editor\" data-id=\"ad66ac6\" data-element_type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t<p>La resoluci\u00f3n de la exposici\u00f3n \u00f3ptica est\u00e1 limitada por la longitud de onda de la luz. Para mejorar la resoluci\u00f3n de la exposici\u00f3n \u00f3ptica, la elecci\u00f3n de la longitud de onda de la luz ha experimentado un proceso de desarrollo desde la l\u00ednea G hasta la l\u00ednea I, el ultravioleta profundo y el ultravioleta extremo con acortamiento continuo.<\/p><p>Los haces de electrones son esencialmente part\u00edculas cargadas y, seg\u00fan la teor\u00eda de la dualidad onda-part\u00edcula, tienen una longitud de onda de<\/p>\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-159ab9a elementor-widget elementor-widget-image\" data-id=\"159ab9a\" data-element_type=\"widget\" data-widget_type=\"image.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t<style>\/*! elementor - v3.21.0 - 20-05-2024 *\/\n.elementor-widget-image{text-align:center}.elementor-widget-image a{display:inline-block}.elementor-widget-image a img[src$=\".svg\"]{width:48px}.elementor-widget-image img{vertical-align:middle;display:inline-block}<\/style>\t\t\t\t\t\t\t\t\t\t<img decoding=\"async\" width=\"240\" height=\"86\" src=\"https:\/\/www.accscicn.com\/wp-content\/uploads\/2022\/12\/\u7406\u8bba\u57fa\u7840.png\" class=\"attachment-large size-large wp-image-29240\" alt=\"\" \/>\t\t\t\t\t\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-67e537b elementor-widget elementor-widget-text-editor\" data-id=\"67e537b\" data-element_type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t<div data-page-id=\"XNWvd0Er4ogPewxzjOMcotAXn9e\" data-docx-has-block-data=\"false\"><div class=\"ace-line ace-line old-record-id-FgiEdU0yiosesexo5VBcw9Vunfh\">Cuanto mayor sea la tensi\u00f3n de aceleraci\u00f3n del haz de electrones, menor ser\u00e1 su longitud de onda, lo que est\u00e1 directamente relacionado con el hecho de que el sistema de exposici\u00f3n al haz de electrones sea de alta tensi\u00f3n o de baja tensi\u00f3n. La longitud de onda del electr\u00f3n a una tensi\u00f3n de aceleraci\u00f3n de 100 KV es, por tanto, de 0,12 nm, lo que constituye la base de su alta resoluci\u00f3n. La litograf\u00eda por haz de electrones convencional utiliza el modo de escritura directa, que es un factor importante en la eficacia relativamente baja de la litograf\u00eda por haz de electrones actual, pero tiene la ventaja de que la escritura directa no requiere una versi\u00f3n de m\u00e1scara y es sencilla y flexible.<\/div><div class=\"ace-line ace-line old-record-id-FgiEdU0yiosesexo5VBcw9Vunfh\">\u00a0<\/div><div class=\"ace-line ace-line old-record-id-FgiEdU0yiosesexo5VBcw9Vunfh\"><span style=\"font-size: 1rem;\">Los haces de electrones, al igual que la luz UV, pueden provocar roturas de enlaces qu\u00edmicos o reacciones de reticulaci\u00f3n en algunos pol\u00edmeros, formando as\u00ed los gr\u00e1ficos correspondientes en el proceso de revelado, y algunos fotorresistentes UV pueden utilizarse a su vez como fotorresistentes de haz de electrones, por lo que en esencia no hay mucha diferencia entre ambos. Sin embargo, la dispersi\u00f3n del haz de electrones en el material puede dar lugar a un proceso mucho m\u00e1s complejo que la litograf\u00eda UV.<\/span><\/div><\/div>\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-19d5c2d elementor-widget elementor-widget-spacer\" data-id=\"19d5c2d\" data-element_type=\"widget\" data-widget_type=\"spacer.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t<div class=\"elementor-spacer\">\n\t\t\t<div class=\"elementor-spacer-inner\"><\/div>\n\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-74e2241 elementor-widget elementor-widget-heading\" data-id=\"74e2241\" data-element_type=\"widget\" data-widget_type=\"heading.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t<h2 class=\"elementor-heading-title elementor-size-default\">Sistemas de exposici\u00f3n por haz de electrones<\/h2>\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-49be5e4 elementor-widget elementor-widget-text-editor\" data-id=\"49be5e4\" data-element_type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t<div data-page-id=\"XNWvd0Er4ogPewxzjOMcotAXn9e\" data-docx-has-block-data=\"false\">La litograf\u00eda por haz de electrones tiene su origen en la microscop\u00eda electr\u00f3nica de barrido y es una tecnolog\u00eda de transferencia gr\u00e1fica basada en el principio del barrido por haz de electrones focalizado. El sistema de litograf\u00eda por haz de electrones consta de tres componentes b\u00e1sicos: ca\u00f1\u00f3n de electrones, lente de electrones, deflector de electrones y componentes auxiliares como el sistema de vac\u00edo y el sistema de control de la mesa de la pieza de trabajo.El ca\u00f1\u00f3n de electrones se utiliza para generar electrones que pueden controlarse y enfocarse, y generalmente se dividen en fuentes termoi\u00f3nicas y fuentes de emisi\u00f3n de campo en funci\u00f3n del modo de funcionamiento. Seg\u00fan el modo de funcionamiento, se dividen generalmente en fuentes termoi\u00f3nicas y fuentes de emisi\u00f3n de campo.\u00a0<br \/><ul><li>La fuente de electrones calientes es un c\u00e1todo calentado a una temperatura lo suficientemente alta como para que los electrones del material del c\u00e1todo puedan ganar suficiente energ\u00eda cin\u00e9tica para permitir que los electrones atraviesen la barrera de potencial de la funci\u00f3n de trabajo del metal del ca\u00f1\u00f3n de electrones y sean emitidos para formar un haz de electrones.\u00a0<\/li><li>La fuente de emisi\u00f3n de campo se forma reforzando el campo el\u00e9ctrico para que los electrones atraviesen la barrera de potencial y formen la fuente de electrones. El enfoque y la desviaci\u00f3n del haz de electrones de la fuente se realiza en la columna del haz de electrones, que consta de una serie de lentes de electrones, diafragmas, deflectores y otros dispositivos. Los electrones son moldeados por el diafragma, convergidos en un punto del haz por la lente de electrones y luego expuestos en el banco por el sistema de desviaci\u00f3n.<\/li><\/ul><\/div>\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-832cb77 elementor-widget elementor-widget-image\" data-id=\"832cb77\" data-element_type=\"widget\" data-widget_type=\"image.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t\t\t\t\t\t\t<img fetchpriority=\"high\" decoding=\"async\" width=\"1711\" height=\"1904\" src=\"https:\/\/www.accscicn.com\/wp-content\/uploads\/2022\/12\/\u7535\u5b50\u675f\u66dd\u5149\u7cfb\u7edf\u793a\u610f\u56fe.jpg\" class=\"attachment-full size-full wp-image-29244\" alt=\"\" srcset=\"https:\/\/www.accscicn.com\/wp-content\/uploads\/2022\/12\/\u7535\u5b50\u675f\u66dd\u5149\u7cfb\u7edf\u793a\u610f\u56fe.jpg 1711w, https:\/\/www.accscicn.com\/wp-content\/uploads\/2022\/12\/\u7535\u5b50\u675f\u66dd\u5149\u7cfb\u7edf\u793a\u610f\u56fe-270x300.jpg 270w, https:\/\/www.accscicn.com\/wp-content\/uploads\/2022\/12\/\u7535\u5b50\u675f\u66dd\u5149\u7cfb\u7edf\u793a\u610f\u56fe-920x1024.jpg 920w, https:\/\/www.accscicn.com\/wp-content\/uploads\/2022\/12\/\u7535\u5b50\u675f\u66dd\u5149\u7cfb\u7edf\u793a\u610f\u56fe-768x855.jpg 768w, https:\/\/www.accscicn.com\/wp-content\/uploads\/2022\/12\/\u7535\u5b50\u675f\u66dd\u5149\u7cfb\u7edf\u793a\u610f\u56fe-1380x1536.jpg 1380w\" sizes=\"(max-width: 1711px) 100vw, 1711px\" \/>\t\t\t\t\t\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-d408503 elementor-widget elementor-widget-spacer\" data-id=\"d408503\" data-element_type=\"widget\" data-widget_type=\"spacer.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t<div class=\"elementor-spacer\">\n\t\t\t<div class=\"elementor-spacer-inner\"><\/div>\n\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-0f00f0b elementor-widget elementor-widget-heading\" data-id=\"0f00f0b\" data-element_type=\"widget\" data-widget_type=\"heading.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t<h3 class=\"elementor-heading-title elementor-size-default\">Indicadores importantes para los sistemas de exposici\u00f3n a haces de electrones<\/h3>\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-15d7f19 elementor-widget elementor-widget-text-editor\" data-id=\"15d7f19\" data-element_type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t<div data-page-id=\"XNWvd0Er4ogPewxzjOMcotAXn9e\" data-docx-has-block-data=\"false\"><ul class=\"list-bullet1\"><li class=\"ace-line ace-line old-record-id-FQgMds6SOoMAKcxodIec3macnbd\" data-list=\"bullet\"><div><b>Di\u00e1metro m\u00ednimo del haz:<\/b>Esto afecta directamente al tama\u00f1o m\u00ednimo de la imagen expuesta. Se pueden conseguir di\u00e1metros de punto m\u00e1s peque\u00f1os ajustando las siguientes medidas: (i) ajustando la tensi\u00f3n de aceleraci\u00f3n lo m\u00e1s alta posible (ii) utilizando una apertura de diafragma m\u00e1s peque\u00f1a (iii) utilizando una distancia de trabajo m\u00e1s peque\u00f1a (iv) ajustando un campo de exploraci\u00f3n m\u00e1s peque\u00f1o (v) ajustando un paso de exposici\u00f3n m\u00e1s peque\u00f1o.<\/div><\/li><li class=\"ace-line ace-line old-record-id-TaC8dY8SUoWWEuxUtyjcVa0pnpg\" data-list=\"bullet\"><div><b>Tensi\u00f3n de aceleraci\u00f3n:<\/b>Generalmente, cuanto mayor es la tensi\u00f3n de aceleraci\u00f3n, de 10 a 100 kv, mayor es la resoluci\u00f3n y menor el efecto de proximidad de la exposici\u00f3n, lo que permite exponer resistencias m\u00e1s gruesas.<\/div><\/li><li class=\"ace-line ace-line old-record-id-K6kAdESoUoy8G0x46KPcRVawnIb\" data-list=\"bullet\"><div><b>Flujo de haces de electrones:<\/b>Cuanto mayor sea la corriente del haz, mayor ser\u00e1 la velocidad de exposici\u00f3n; la velocidad m\u00e1xima de exposici\u00f3n est\u00e1 limitada por la frecuencia de barrido y el punto del haz ser\u00e1 mayor para corrientes del haz mayores.<\/div><\/li><li class=\"ace-line ace-line old-record-id-TUEYdmsWYoCkeAxWk0OcApntnAc\" data-list=\"bullet\"><div><b>Velocidad de escaneado:<\/b>Cuanto mayor sea la velocidad de exploraci\u00f3n, mayor ser\u00e1 la velocidad de exposici\u00f3n, expresada en frecuencia (por ejemplo, 50 MHz)<\/div><\/li><li class=\"ace-line ace-line old-record-id-BqEQdKYgmou2skxagHdcSkPSnjh\" data-list=\"bullet\"><div><b>Tama\u00f1o del campo de exploraci\u00f3n:<\/b>Con un campo de escaneado grande, la mayor parte de la imagen expuesta puede exponerse dentro del campo de escaneado, lo que evita errores causados por la uni\u00f3n del campo de escaneado.<\/div><\/li><li class=\"ace-line ace-line old-record-id-Fk8qdqas4oYEMUxsVh5cDPeLnBe\" data-list=\"bullet\"><div>Tambi\u00e9n la precisi\u00f3n del movimiento de la mesa, la precisi\u00f3n del registro, la precisi\u00f3n del empalme de campo, etc.<\/div><\/li><\/ul><\/div>\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-22fb227 elementor-widget elementor-widget-spacer\" data-id=\"22fb227\" data-element_type=\"widget\" data-widget_type=\"spacer.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t<div class=\"elementor-spacer\">\n\t\t\t<div class=\"elementor-spacer-inner\"><\/div>\n\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-1c31e25 elementor-widget elementor-widget-heading\" data-id=\"1c31e25\" data-element_type=\"widget\" data-widget_type=\"heading.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t<h3 class=\"elementor-heading-title elementor-size-default\">Clasificaci\u00f3n de los m\u00e9todos de exposici\u00f3n al haz de electrones<\/h3>\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-32be761 elementor-widget elementor-widget-heading\" data-id=\"32be761\" data-element_type=\"widget\" data-widget_type=\"heading.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t<h3 class=\"elementor-heading-title elementor-size-default\">Dividido por m\u00e9todo de trabajo<\/h3>\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-c68b8fd elementor-widget elementor-widget-text-editor\" data-id=\"c68b8fd\" data-element_type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t<p>Exposici\u00f3n de proyecci\u00f3n (requiere m\u00e1scara) y exposici\u00f3n directa (no requiere m\u00e1scara)<\/p>\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-4c11ef7 elementor-widget elementor-widget-image\" data-id=\"4c11ef7\" data-element_type=\"widget\" data-widget_type=\"image.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t\t\t\t\t\t\t<img decoding=\"async\" width=\"1024\" height=\"664\" src=\"https:\/\/www.accscicn.com\/wp-content\/uploads\/2022\/12\/\u76f4\u5199\u5f0f\u7535\u5b50\u675f\u66dd\u5149\u548c\u6295\u5f71\u5f0f\u7535\u5b50\u675f\u66dd\u5149-1024x664.jpg\" class=\"attachment-large size-large wp-image-29245\" alt=\"\" srcset=\"https:\/\/www.accscicn.com\/wp-content\/uploads\/2022\/12\/\u76f4\u5199\u5f0f\u7535\u5b50\u675f\u66dd\u5149\u548c\u6295\u5f71\u5f0f\u7535\u5b50\u675f\u66dd\u5149-1024x664.jpg 1024w, https:\/\/www.accscicn.com\/wp-content\/uploads\/2022\/12\/\u76f4\u5199\u5f0f\u7535\u5b50\u675f\u66dd\u5149\u548c\u6295\u5f71\u5f0f\u7535\u5b50\u675f\u66dd\u5149-300x195.jpg 300w, https:\/\/www.accscicn.com\/wp-content\/uploads\/2022\/12\/\u76f4\u5199\u5f0f\u7535\u5b50\u675f\u66dd\u5149\u548c\u6295\u5f71\u5f0f\u7535\u5b50\u675f\u66dd\u5149-768x498.jpg 768w, https:\/\/www.accscicn.com\/wp-content\/uploads\/2022\/12\/\u76f4\u5199\u5f0f\u7535\u5b50\u675f\u66dd\u5149\u548c\u6295\u5f71\u5f0f\u7535\u5b50\u675f\u66dd\u5149.jpg 1119w\" sizes=\"(max-width: 1024px) 100vw, 1024px\" \/>\t\t\t\t\t\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-6b42c7c elementor-widget elementor-widget-spacer\" data-id=\"6b42c7c\" data-element_type=\"widget\" data-widget_type=\"spacer.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t<div class=\"elementor-spacer\">\n\t\t\t<div class=\"elementor-spacer-inner\"><\/div>\n\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-9aa12d7 elementor-widget elementor-widget-heading\" data-id=\"9aa12d7\" data-element_type=\"widget\" data-widget_type=\"heading.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t<h3 class=\"elementor-heading-title elementor-size-default\">Dividido por m\u00e9todo de escaneado<\/h3>\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-d40ed84 elementor-widget elementor-widget-text-editor\" data-id=\"d40ed84\" data-element_type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t<p>Hay un escaneado raster y un escaneado vectorial<\/p>\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-962381b elementor-widget elementor-widget-image\" data-id=\"962381b\" data-element_type=\"widget\" data-widget_type=\"image.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t\t\t\t\t\t\t<img loading=\"lazy\" decoding=\"async\" width=\"959\" height=\"469\" src=\"https:\/\/www.accscicn.com\/wp-content\/uploads\/2022\/12\/\u5149\u6805\u626b\u63cf\u548c\u77e2\u91cf\u626b\u63cf.jpg\" class=\"attachment-large size-large wp-image-29246\" alt=\"\" srcset=\"https:\/\/www.accscicn.com\/wp-content\/uploads\/2022\/12\/\u5149\u6805\u626b\u63cf\u548c\u77e2\u91cf\u626b\u63cf.jpg 959w, https:\/\/www.accscicn.com\/wp-content\/uploads\/2022\/12\/\u5149\u6805\u626b\u63cf\u548c\u77e2\u91cf\u626b\u63cf-300x147.jpg 300w, https:\/\/www.accscicn.com\/wp-content\/uploads\/2022\/12\/\u5149\u6805\u626b\u63cf\u548c\u77e2\u91cf\u626b\u63cf-768x376.jpg 768w\" sizes=\"(max-width: 959px) 100vw, 959px\" \/>\t\t\t\t\t\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-e080234 elementor-widget elementor-widget-text-editor\" data-id=\"e080234\" data-element_type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t<div data-page-id=\"XNWvd0Er4ogPewxzjOMcotAXn9e\" data-docx-has-block-data=\"false\"><ul><li><div class=\"ace-line ace-line old-record-id-XQ6kdKEKKo2804xMvHacQEA5nUd\" style=\"font-style: inherit; font-weight: inherit; display: inline !important;\"><strong>Escaneado de trama<\/strong><\/div><span style=\"font-style: inherit; font-weight: inherit; font-size: 1rem;\">Utilizando un haz circular gaussiano, el haz de electrones se explora continuamente punto por punto en todo el campo de exploraci\u00f3n, y la imagen se expone controlando la apertura y el cierre del obturador (puerta del haz).<\/span>La ventaja del escaneado de trama es que es f\u00e1cil de controlar y no requiere el control del sistema de desviaci\u00f3n. La desventaja es la baja eficiencia de producci\u00f3n. Debido al peque\u00f1o campo de exploraci\u00f3n, la exposici\u00f3n debe completarse junto con el movimiento de la mesa de la pieza de trabajo.<\/li><\/ul>\n<div class=\"ace-line ace-line old-record-id-AW6QdCkKkomCKIx2nPacrDn1nHh\" style=\"font-style: inherit; font-weight: inherit;\">\n<ul>\n<li><strong>Exploraci\u00f3n vectorial<\/strong>Las ventajas de la exploraci\u00f3n vectorial son que la exposici\u00f3n es eficiente, s\u00f3lo se explora el \u00e1rea gr\u00e1fica para la exposici\u00f3n, lo que reduce el tiempo empleado por el objetivo en el \u00e1rea no gr\u00e1fica, y se puede utilizar un haz rectangular variable. La desventaja es que el sistema de control es complejo, ya que el deflector debe controlarse para la exploraci\u00f3n vectorial, a diferencia de la exploraci\u00f3n de trama, en la que se utiliza una deflexi\u00f3n fija.<\/li>\n<\/ul>\n<\/div>\n<ul class=\"list-bullet1\">\n<\/ul>\n<\/div>\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-0e4bf2f elementor-widget elementor-widget-heading\" data-id=\"0e4bf2f\" data-element_type=\"widget\" data-widget_type=\"heading.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t<h3 class=\"elementor-heading-title elementor-size-default\">Por la forma del haz de electrones<\/h3>\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-81a4dcd elementor-widget elementor-widget-text-editor\" data-id=\"81a4dcd\" data-element_type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t<div data-page-id=\"XNWvd0Er4ogPewxzjOMcotAXn9e\" data-docx-has-block-data=\"false\"><div class=\"ace-line ace-line old-record-id-TgYgdgkUCo6eO0xmm50coyxBnpe\">Se dividen en haces gaussianos (haces circulares) y haces de electrones deformados (haces rectangulares)<\/div><\/div>\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-1423dd3 elementor-widget elementor-widget-image\" data-id=\"1423dd3\" data-element_type=\"widget\" data-widget_type=\"image.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t\t\t\t\t\t\t<img loading=\"lazy\" decoding=\"async\" width=\"1024\" height=\"557\" src=\"https:\/\/www.accscicn.com\/wp-content\/uploads\/2022\/12\/3\u79cd\u4e0d\u540c\u675f\u6591\u6a21\u5f0f-1024x557.jpg\" class=\"attachment-large size-large wp-image-29247\" alt=\"\" srcset=\"https:\/\/www.accscicn.com\/wp-content\/uploads\/2022\/12\/3\u79cd\u4e0d\u540c\u675f\u6591\u6a21\u5f0f-1024x557.jpg 1024w, https:\/\/www.accscicn.com\/wp-content\/uploads\/2022\/12\/3\u79cd\u4e0d\u540c\u675f\u6591\u6a21\u5f0f-300x163.jpg 300w, https:\/\/www.accscicn.com\/wp-content\/uploads\/2022\/12\/3\u79cd\u4e0d\u540c\u675f\u6591\u6a21\u5f0f-768x418.jpg 768w, https:\/\/www.accscicn.com\/wp-content\/uploads\/2022\/12\/3\u79cd\u4e0d\u540c\u675f\u6591\u6a21\u5f0f.jpg 1258w\" sizes=\"(max-width: 1024px) 100vw, 1024px\" \/>\t\t\t\t\t\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-4dfbf5b elementor-widget elementor-widget-text-editor\" data-id=\"4dfbf5b\" data-element_type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t<p>En el modo de exploraci\u00f3n vectorial, el tiempo de exposici\u00f3n del patr\u00f3n est\u00e1 relacionado con el n\u00famero de proyecciones del punto del haz.<span style=\"font-style: inherit; font-weight: inherit;\">En el patr\u00f3n de punto de haz gaussiano fijo (haz circular), necesitamos realizar 24 proyecciones.\u00a0<\/span><\/p><p>Para acelerar la velocidad de exposici\u00f3n, el patr\u00f3n puede descomponerse en combinaciones del patr\u00f3n b\u00e1sico m\u00e1s peque\u00f1o, utilizando el patr\u00f3n b\u00e1sico m\u00e1s peque\u00f1o como forma del punto del haz de electrones. S\u00f3lo se requieren 6 proyecciones en este modo de punto de haz modificado.<\/p><p>\u00a0En la pr\u00e1ctica, sin embargo, el patr\u00f3n no es constante y la forma b\u00e1sica del haz debe reajustarse con frecuencia, por lo que se requiere un m\u00e9todo de proyecci\u00f3n m\u00e1s flexible. Un patr\u00f3n de haz variable puede utilizarse en situaciones en las que el patr\u00f3n es diverso. Como se muestra en la figura siguiente, en el modo de patr\u00f3n de haz variable, el punto del haz de electrones puede ajustarse al patr\u00f3n espec\u00edfico, cambiando la forma b\u00e1sica del punto del haz y reduciendo el n\u00famero de proyecciones a tres.<\/p>\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-156fee9 elementor-widget elementor-widget-spacer\" data-id=\"156fee9\" data-element_type=\"widget\" data-widget_type=\"spacer.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t<div class=\"elementor-spacer\">\n\t\t\t<div class=\"elementor-spacer-inner\"><\/div>\n\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-e785c77 elementor-widget elementor-widget-heading\" data-id=\"e785c77\" data-element_type=\"widget\" data-widget_type=\"heading.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t<h2 class=\"elementor-heading-title elementor-size-default\">Introducci\u00f3n a las fotorresistencias por haz de electrones<\/h2>\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-dcabd85 elementor-widget elementor-widget-text-editor\" data-id=\"dcabd85\" data-element_type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t<p><strong>Fotoresistente<\/strong> (Fotoresistente; tambi\u00e9n conocido como fotorresistente ) es un material de pel\u00edcula fina resistente al grabado cuya solubilidad se modifica por irradiaci\u00f3n o radiaci\u00f3n de fuentes luminosas como la luz ultravioleta, los l\u00e1seres excimer, los haces de electrones, los haces de iones y los rayos X.<\/p><p><b>Las fotorresistencias de haz de electrones suelen dividirse en fotorresistencias positivas y negativas<\/b>pueden dividirse en funci\u00f3n de qui\u00e9n domine la reacci\u00f3n de reticulaci\u00f3n o la ruptura del enlace qu\u00edmico tras la irradiaci\u00f3n fotorresistente.<strong>Las propiedades positivas y negativas de las fotorresistencias no son absolutas<\/strong>Las propiedades de, por ejemplo, las colas positivas de haz de electrones PMMA pueden utilizarse como colas negativas cuando las colas de la zona expuesta se carbonizan a una dosis de exposici\u00f3n 10 veces superior a la normal, lo que produce residuos durante el proceso de revelado.<\/p>\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-d932e1c elementor-widget elementor-widget-image\" data-id=\"d932e1c\" data-element_type=\"widget\" data-widget_type=\"image.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t\t\t\t\t\t\t<img loading=\"lazy\" decoding=\"async\" width=\"1024\" height=\"589\" src=\"https:\/\/www.accscicn.com\/wp-content\/uploads\/2022\/12\/PMMA-\u5316\u5b66\u952e\u65ad\u88c2\u548c\u4ea4\u8054\u8fc7\u7a0b\u793a\u610f\u56fe-1024x589.jpg\" class=\"attachment-large size-large wp-image-29248\" alt=\"\" srcset=\"https:\/\/www.accscicn.com\/wp-content\/uploads\/2022\/12\/PMMA-\u5316\u5b66\u952e\u65ad\u88c2\u548c\u4ea4\u8054\u8fc7\u7a0b\u793a\u610f\u56fe-1024x589.jpg 1024w, https:\/\/www.accscicn.com\/wp-content\/uploads\/2022\/12\/PMMA-\u5316\u5b66\u952e\u65ad\u88c2\u548c\u4ea4\u8054\u8fc7\u7a0b\u793a\u610f\u56fe-300x173.jpg 300w, https:\/\/www.accscicn.com\/wp-content\/uploads\/2022\/12\/PMMA-\u5316\u5b66\u952e\u65ad\u88c2\u548c\u4ea4\u8054\u8fc7\u7a0b\u793a\u610f\u56fe-768x442.jpg 768w, https:\/\/www.accscicn.com\/wp-content\/uploads\/2022\/12\/PMMA-\u5316\u5b66\u952e\u65ad\u88c2\u548c\u4ea4\u8054\u8fc7\u7a0b\u793a\u610f\u56fe.jpg 1237w\" sizes=\"(max-width: 1024px) 100vw, 1024px\" \/>\t\t\t\t\t\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-3d4ed47 elementor-widget elementor-widget-text-editor\" data-id=\"3d4ed47\" data-element_type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t<p><strong>Fotorresistencia positiva (ortho-glue): en la fotorresistencia domina la reacci\u00f3n qu\u00edmica de ruptura de enlaces en la zona expuesta y es f\u00e1cilmente soluble en el revelador. <\/strong><\/p><p><strong>Fotoresistencia negativa (adhesivo negativo): la reacci\u00f3n de reticulaci\u00f3n de la fotoresistencia en la zona de exposici\u00f3n es dominante y consiste en peque\u00f1as mol\u00e9culas reticuladas y polimerizadas en grandes mol\u00e9culas, dif\u00edciles de disolver en la soluci\u00f3n de revelado. <\/strong><\/p>\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-d763306 elementor-widget elementor-widget-image\" data-id=\"d763306\" data-element_type=\"widget\" data-widget_type=\"image.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t\t\t\t\t\t\t<img loading=\"lazy\" decoding=\"async\" width=\"1024\" height=\"847\" src=\"https:\/\/www.accscicn.com\/wp-content\/uploads\/2022\/12\/\u6b63\u80f6\u548c\u8d1f\u80f6-1024x847.jpg\" class=\"attachment-large size-large wp-image-29249\" alt=\"\" srcset=\"https:\/\/www.accscicn.com\/wp-content\/uploads\/2022\/12\/\u6b63\u80f6\u548c\u8d1f\u80f6-1024x847.jpg 1024w, https:\/\/www.accscicn.com\/wp-content\/uploads\/2022\/12\/\u6b63\u80f6\u548c\u8d1f\u80f6-300x248.jpg 300w, https:\/\/www.accscicn.com\/wp-content\/uploads\/2022\/12\/\u6b63\u80f6\u548c\u8d1f\u80f6-768x635.jpg 768w, https:\/\/www.accscicn.com\/wp-content\/uploads\/2022\/12\/\u6b63\u80f6\u548c\u8d1f\u80f6-1536x1271.jpg 1536w, https:\/\/www.accscicn.com\/wp-content\/uploads\/2022\/12\/\u6b63\u80f6\u548c\u8d1f\u80f6-2048x1695.jpg 2048w\" sizes=\"(max-width: 1024px) 100vw, 1024px\" \/>\t\t\t\t\t\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-9eac62e elementor-widget elementor-widget-heading\" data-id=\"9eac62e\" data-element_type=\"widget\" data-widget_type=\"heading.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t<h3 class=\"elementor-heading-title elementor-size-default\">Par\u00e1metros clave de las fotorresistencias<\/h3>\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-bac22de elementor-widget elementor-widget-text-editor\" data-id=\"bac22de\" data-element_type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t<p>Al igual que las fotorresistencias UV, una fotorresistencia suele seleccionarse o evaluarse para su aplicaci\u00f3n en un proceso en funci\u00f3n de cuatro par\u00e1metros: sensibilidad, contraste, resoluci\u00f3n y resistencia al grabado.<\/p>\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-9bfcf57 elementor-widget elementor-widget-text-editor\" data-id=\"9bfcf57\" data-element_type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t<div data-page-id=\"XNWvd0Er4ogPewxzjOMcotAXn9e\" data-docx-has-block-data=\"false\"><div class=\"ace-line ace-line old-record-id-JIsydAqmQokkmWxGMFyc3r5TnUh\" style=\"font-style: inherit; font-weight: inherit;\"><ul><li><div class=\"ace-line ace-line old-record-id-P0iYdeKQWoswqgxuUKRcT9t0npg\" style=\"font-style: inherit; font-weight: inherit; display: inline !important;\"><strong>Sensibilidad:<\/strong>Cuanto mayor sea la sensibilidad del material fotorresistente, menor ser\u00e1 la dosis de exposici\u00f3n (irradiaci\u00f3n) necesaria. En la sensibilidad influyen la capacidad de electrones keV (o la tensi\u00f3n de aceleraci\u00f3n kV), el material del sustrato, las condiciones del proceso, el revelador utilizado y otros factores<\/div><\/li><li><strong>Contraste:<\/strong>El alto contraste proporciona paredes laterales m\u00e1s inclinadas, mayor margen de procesamiento, mejor resoluci\u00f3n, estructura de mayor relaci\u00f3n de aspecto, lo que la hace menos sensible a los efectos de proximidad, y mayor densidad de patrones. El bajo contraste s\u00f3lo est\u00e1 disponible para la litograf\u00eda 3D en escala de grises.<\/li><li><strong>Resoluci\u00f3n:<\/strong>define el tama\u00f1o de la caracter\u00edstica m\u00e1s peque\u00f1a que se puede obtener o la distancia m\u00ednima entre dos estructuras.<\/li><li><strong>Resistente al grabado:<\/strong>Si se requiere un proceso de grabado posterior, elija una fotorresistencia que mantenga su integridad durante el grabado qu\u00edmico (h\u00famedo) y f\u00edsico (seco).<\/li><\/ul><\/div><\/div>\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-924d6d6 elementor-widget elementor-widget-text-editor\" data-id=\"924d6d6\" data-element_type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t<p>La selecci\u00f3n de una fotorresistencia adecuada tambi\u00e9n debe considerarse en relaci\u00f3n con las caracter\u00edsticas positivas y negativas de la fotorresistencia, la tolerancia del proceso, la adhesi\u00f3n, la fluidez t\u00e9rmica, los efectos de expansi\u00f3n, la duraci\u00f3n de almacenamiento y otros par\u00e1metros.<\/p>\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-8906c50 elementor-widget elementor-widget-spacer\" data-id=\"8906c50\" data-element_type=\"widget\" data-widget_type=\"spacer.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t<div class=\"elementor-spacer\">\n\t\t\t<div class=\"elementor-spacer-inner\"><\/div>\n\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-e95e39e elementor-widget elementor-widget-heading\" data-id=\"e95e39e\" data-element_type=\"widget\" data-widget_type=\"heading.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t<h3 class=\"elementor-heading-title elementor-size-default\">Fotorresistencias de uso com\u00fan<\/h3>\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-194ff2f elementor-widget elementor-widget-text-editor\" data-id=\"194ff2f\" data-element_type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t<p>En esta secci\u00f3n se presentan las fotorresistencias de haz de electrones concentrado m\u00e1s utilizadas en experimentos, como PMMA positivo, ZEP-520A, AR-P 6200 (SCAR62) y HSQ negativo.<\/p>\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-4027a96 elementor-widget elementor-widget-heading\" data-id=\"4027a96\" data-element_type=\"widget\" data-widget_type=\"heading.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t<h4 class=\"elementor-heading-title elementor-size-default\">PMMA (pegamento ortop\u00e9dico)<\/h4>\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-a68d2bf elementor-widget elementor-widget-text-editor\" data-id=\"a68d2bf\" data-element_type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t<p>El PMMA (polimetacrilato de metilo), un pol\u00edmero, tambi\u00e9n conocido como acr\u00edlico o plexigl\u00e1s, es actualmente el fotorresistente de haz de electrones m\u00e1s popular. 5%~10% de polvo de PMMA y clorobenceno o anisol (menos t\u00f3xico, 2-4%) pueden mezclarse completamente para fabricar el fotorresistente de PMMA. fotorresistente.<\/p>\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-9fe2eaf elementor-widget elementor-widget-text-editor\" data-id=\"9fe2eaf\" data-element_type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t<ul><li>Barato, duradero y f\u00e1cil de manejar<\/li><li>Resoluci\u00f3n y contraste muy elevados<\/li><li>Baja sensibilidad<\/li><li><span style=\"font-style: inherit; font-weight: inherit;\">Escasa resistencia al grabado en seco (buena para el despegado, no adecuada para la transferencia directa de patrones de grabado).<\/span><\/li><li><span style=\"font-style: inherit; font-weight: inherit;\">La sensibilidad aumenta a medida que disminuye la masa molecular relativa, siendo las masas moleculares relativas t\u00edpicas para el PMMA de 495 kg\/mol y 950 kg\/mo<\/span><\/li><li><span style=\"font-style: inherit; font-weight: inherit;\">\u00a0El contraste y la sensibilidad pueden modularse cambiando la proporci\u00f3n de MIBK en la mezcla de revelador (MIBK:IPA), aumentando la sensibilidad con la proporci\u00f3n de MIBK en el revelador y lo contrario para el contraste.<\/span><\/li><\/ul>\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-1d54204 elementor-widget elementor-widget-heading\" data-id=\"1d54204\" data-element_type=\"widget\" data-widget_type=\"heading.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t<h4 class=\"elementor-heading-title elementor-size-default\">Zep-520A (goma positiva)<\/h4>\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-c9c7909 elementor-widget elementor-widget-text-editor\" data-id=\"c9c7909\" data-element_type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t<p>Zep-520A, el fotorresistente comercial m\u00e1s popular, fue desarrollado por Nippon Zeon en Jap\u00f3n como un PMMA modificado con un anillo de benceno, consistente en un copol\u00edmero de \u03b1-clorometacrilato y \u03b1-metilestireno, utilizado como sustituto del PMMA.<\/p>\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-7cc1275 elementor-widget elementor-widget-text-editor\" data-id=\"7cc1275\" data-element_type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t<div data-page-id=\"XNWvd0Er4ogPewxzjOMcotAXn9e\" data-docx-has-block-data=\"false\"><ul class=\"list-bullet1\"><li class=\"ace-line ace-line old-record-id-Qea8dEo0MoogMkxmoOJcB8EEnfd\" data-list=\"bullet\"><div>Alta resoluci\u00f3n y alto contraste con una alta resoluci\u00f3n comparable a la del PMMA (10-30nm de estructura gr\u00e1fica alcanzable) y alto contraste<\/div><\/li><li class=\"ace-line ace-line old-record-id-KKgud6s0Wo6SyIx0uLscy7cXnbe\" data-list=\"bullet\"><div>Alta sensibilidad, con la mayor sensibilidad del PMMA (de 3 a 5 veces)<\/div><\/li><li class=\"ace-line ace-line old-record-id-QSAIduswMosq8kx6rgFcFe7Cn4d\" data-list=\"bullet\"><div>Alta resistencia al grabado en seco, m\u00e1s de 5 veces m\u00e1s resistente al grabado en seco en comparaci\u00f3n con el PMMA.<\/div><\/li><li class=\"ace-line ace-line old-record-id-Tw6YdMGW4okQSOx8rz6cOrsEn9f\" data-list=\"bullet\"><div>Caro y con una vida \u00fatil de un a\u00f1o.<\/div><\/li><li class=\"ace-line ace-line old-record-id-P8EUd8iQIoOs4ExWKsYcPajxnTd\" data-list=\"bullet\"><div>Para tasas de clasificaci\u00f3n ultra altas (sub-10nm), puede ser preferible el uso de PMMA.<\/div><\/li><li class=\"ace-line ace-line old-record-id-FqeQd6eygo2mWMxcbsdc4EDwnRf\" data-list=\"bullet\"><div>ZEP-520A no es f\u00e1cil de quitar despu\u00e9s de la exposici\u00f3n, el desarrollo y la cocci\u00f3n de la pel\u00edcula firme, por lo general ZDMAC se utiliza para eliminar el adhesivo.<\/div><\/li><\/ul><\/div>\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-6ff5f9b elementor-widget elementor-widget-heading\" data-id=\"6ff5f9b\" data-element_type=\"widget\" data-widget_type=\"heading.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t<h4 class=\"elementor-heading-title elementor-size-default\">AR-P 6200 (CSAR62) (caucho positivo)<\/h4>\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-d278dfb elementor-widget elementor-widget-text-editor\" data-id=\"d278dfb\" data-element_type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t<div data-page-id=\"XNWvd0Er4ogPewxzjOMcotAXn9e\" data-docx-has-block-data=\"false\"><ul class=\"list-bullet1\"><li class=\"ace-line ace-line old-record-id-GcwQd6kaKouwYAxg3Sjcd8denQc\" data-list=\"bullet\"><div>Resoluci\u00f3n ultra alta (&lt;10 nm)<\/div><\/li><li class=\"ace-line ace-line old-record-id-CYQ0duUgQoyaCUx8I8ccwWNBnjb\" data-list=\"bullet\"><div>Alta sensibilidad, la sensibilidad puede ajustarse seleccionando el revelador adecuado.<\/div><\/li><li class=\"ace-line ace-line old-record-id-Dc8adIuCGoEEmKxKr4ecbY0OnY2\" data-list=\"bullet\"><div>Relaci\u00f3n de contraste elevada (&gt;15)<\/div><\/li><li class=\"ace-line ace-line old-record-id-QKscd4IaEoeg0qxIFtXcmrCYn8e\" data-list=\"bullet\"><div>Relaci\u00f3n de aspecto de alto a profundo (hasta 20:1)<\/div><\/li><li class=\"ace-line ace-line old-record-id-TQoqdKg2IoEKIMx8PVdcmXJPnbh\" data-list=\"bullet\"><div>Buena estabilidad de proceso y resistencia al grabado en seco, que duplica la del PMMA;<\/div><\/li><li class=\"ace-line ace-line old-record-id-Sq8IdowKaoGyKkx4eU2c9LNBnkd\" data-list=\"bullet\"><div>Buena adherencia al sustrato, menos propenso a despegarse y agrietarse;<\/div><\/li><li class=\"ace-line ace-line old-record-id-TcIYdWC6KoSEiixGGT2ckOoCn9b\" data-list=\"bullet\"><div>M\u00f3dulo de Young bajo, propenso al colapso, la adherencia y el vuelco;<\/div><\/li><li class=\"ace-line ace-line old-record-id-N26SdcUiOomiUix2p01c6rmenAh\" data-list=\"bullet\"><div>Puntos de fusi\u00f3n m\u00e1s bajos, que pueden producir resistencia a la fusi\u00f3n;<\/div><\/li><li class=\"ace-line ace-line old-record-id-VYAudsGcWoE0SCxQkCZc435cnsb\" data-list=\"bullet\"><div>Las superficies gr\u00e1ficas tienden a encogerse<\/div><\/li><\/ul><\/div>\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-3ee851f elementor-widget elementor-widget-heading\" data-id=\"3ee851f\" data-element_type=\"widget\" data-widget_type=\"heading.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t<h4 class=\"elementor-heading-title elementor-size-default\">HSQ (pegamento negativo)<\/h4>\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-a3b4629 elementor-widget elementor-widget-text-editor\" data-id=\"a3b4629\" data-element_type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t<div data-page-id=\"XNWvd0Er4ogPewxzjOMcotAXn9e\" data-docx-has-block-data=\"false\"><div class=\"ace-line ace-line old-record-id-SmeGdOWOuoMMGsxcbIJcc92Hnpg\">Desarrollado por Dow Corning, el HSQ es un compuesto inorg\u00e1nico a base de s\u00edlice formado por una resina de hidr\u00f3geno silsesquioxano (HSQ) en un disolvente portador metilisobutilcetona (MIBK).<\/div><\/div>\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-4910efa elementor-widget elementor-widget-text-editor\" data-id=\"4910efa\" data-element_type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t<div data-page-id=\"XNWvd0Er4ogPewxzjOMcotAXn9e\" data-docx-has-block-data=\"false\"><ul class=\"list-bullet1\"><li class=\"ace-line ace-line old-record-id-KeIEduKgyo28q8xYpNic3Ui2nSf\" data-list=\"bullet\"><div>Resoluci\u00f3n muy alta (&lt;10 nm)<\/div><\/li><li class=\"ace-line ace-line old-record-id-QgscdOCK8osGMixYvK0cLW2Hnsd\" data-list=\"bullet\"><div>Baja sensibilidad y largos tiempos de exposici\u00f3n;<\/div><\/li><li class=\"ace-line ace-line old-record-id-AeQUdcIiOoIMW6xm42Nc6RzVnLc\" data-list=\"bullet\"><div>Desarrollo por reacci\u00f3n qu\u00edmica (reacci\u00f3n de HSQ no expuesta con revelador NH4OH o NaOH diluido para formar H2), no por disoluci\u00f3n, con buena estabilidad del proceso postdesarrollo;<\/div><\/li><li class=\"ace-line ace-line old-record-id-K6WGdWGAsoquuMxSC7Kc5bbknKg\" data-list=\"bullet\"><div>Buen rendimiento de visualizaci\u00f3n en microscop\u00eda electr\u00f3nica, sin chapado en oro;<\/div><\/li><li class=\"ace-line ace-line old-record-id-QCuIdQw4WoAq4Wx8n9icmmmYnPe\" data-list=\"bullet\"><div>Un buen material de m\u00e1scara para grabar silicio;<\/div><\/li><li class=\"ace-line ace-line old-record-id-GiCedkgyGowgWAx2p28cW3Fannf\" data-list=\"bullet\"><div>La vida \u00fatil es corta, con un periodo de almacenamiento de s\u00f3lo 6 meses. HSQ (H-SiOx) en polvo tendr\u00e1 una vida \u00fatil m\u00e1s larga.<\/div><\/li><li class=\"ace-line ace-line old-record-id-MSiedyCWwoO0agxclitcXTTznJb\" data-list=\"bullet\"><div>Condiciones duras de almacenamiento, el gel es susceptible a la oxidaci\u00f3n y al curado gelatinoso cuando se expone al aire y necesita mantenerse sellado a bajas temperaturas (5\u00b0C);<\/div><\/li><li class=\"ace-line ace-line old-record-id-Ckwcdk4UYoYwGaxUBM0ceKIKnlr\" data-list=\"bullet\"><div>Estructuras de muy alto contraste, f\u00e1ciles de preparar, con perfiles empinados y rectos y elevadas relaciones de aspecto;<\/div><\/li><li class=\"ace-line ace-line old-record-id-MIkwdcqC0oOcuqxA7RhcJ0aqnSc\" data-list=\"bullet\"><div>Una fotorresistencia estirable con buena verticalidad de los bordes de l\u00ednea tras el revelado;<\/div><\/li><li class=\"ace-line ace-line old-record-id-OGoadciKyoYuqSx0mLDcnWZGnQc\" data-list=\"bullet\"><div>Buena adherencia, tenacidad e irrompibilidad;<\/div><\/li><\/ul><\/div>\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-9d6770e elementor-widget elementor-widget-heading\" data-id=\"9d6770e\" data-element_type=\"widget\" data-widget_type=\"heading.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t<h2 class=\"elementor-heading-title elementor-size-default\">Efecto de proximidad<\/h2>\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-6df3577 elementor-widget elementor-widget-text-editor\" data-id=\"6df3577\" data-element_type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t<p>El efecto de proximidad de la exposici\u00f3n con haz de electrones se produce cuando dos patrones expuestos est\u00e1n pr\u00f3ximos entre s\u00ed, debido a la dispersi\u00f3n de electrones en el fotorresistente y el sustrato para hacer que los electrones se desv\u00eden de la direcci\u00f3n original de incidencia, lo que provoca la exposici\u00f3n de zonas adyacentes que no deber\u00edan exponerse, mientras que algunas zonas que deber\u00edan exponerse no reciben suficiente exposici\u00f3n, lo que provoca la distorsi\u00f3n del patr\u00f3n expuesto. Esto provoca problemas como la reducci\u00f3n del contraste y de la resoluci\u00f3n.<\/p>\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-820b2ce elementor-widget elementor-widget-heading\" data-id=\"820b2ce\" data-element_type=\"widget\" data-widget_type=\"heading.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t<h3 class=\"elementor-heading-title elementor-size-default\">M\u00e9todo de correcci\u00f3n<\/h3>\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-d2b02a7 elementor-widget elementor-widget-text-editor\" data-id=\"d2b02a7\" data-element_type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t<div data-page-id=\"XNWvd0Er4ogPewxzjOMcotAXn9e\" data-docx-has-block-data=\"false\"><div><b>Existen tres m\u00e9todos de correcci\u00f3n de los efectos de proximidad: \u2460Correcci\u00f3n de la dosis \u2461Compensaci\u00f3n del tama\u00f1o del gr\u00e1fico \u2462Compensaci\u00f3n de la exposici\u00f3n al fondo.<\/b><\/div><div><b>\u00a0<\/b><\/div><ul><li data-list=\"bullet\"><div><b>Correcci\u00f3n de la dosis<\/b>Es el m\u00e9todo m\u00e1s com\u00fan y m\u00e1s eficaz, y se basa en el principio de que todas las im\u00e1genes expuestas se exponen artificialmente a una cantidad uniforme de energ\u00eda.<b>La correcci\u00f3n de dosis tambi\u00e9n se divide en: la t\u00e9cnica autoconsistente (correcci\u00f3n f\u00edsica) y el m\u00e9todo de corte geom\u00e9trico.<\/b><span style=\"font-style: inherit;\">T\u00e9cnica autoconsistente (correcci\u00f3n f\u00edsica)<span style=\"font-weight: inherit;\">: relativamente precisos, pero intensivos desde el punto de vista computacional para los dise\u00f1os de circuitos integrados a gran escala;<\/span><\/span><span style=\"font-style: inherit; font-weight: inherit;\">M\u00e9todo de corte geom\u00e9trico: la distribuci\u00f3n de la dosis de exposici\u00f3n calculada es m\u00e1s gruesa, pero el c\u00e1lculo es muy r\u00e1pido;<\/span><\/div><\/li><li data-list=\"bullet\"><div><b>Compensaci\u00f3n del tama\u00f1o gr\u00e1fico<\/b>Compensa los efectos de la energ\u00eda local alta o baja reduciendo o aumentando el tama\u00f1o de cada gr\u00e1fico, y es adecuado para gr\u00e1ficos con repetici\u00f3n de ciclo simple.<\/div><\/li><\/ul><\/div>\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-d283c30 elementor-widget elementor-widget-image\" data-id=\"d283c30\" data-element_type=\"widget\" data-widget_type=\"image.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t\t\t\t\t\t\t<img loading=\"lazy\" decoding=\"async\" width=\"995\" height=\"683\" src=\"https:\/\/www.accscicn.com\/wp-content\/uploads\/2022\/12\/\u90bb\u8fd1\u6548\u5e94\u6821\u6b63\u6548\u679c\u5bf9\u6bd4-1.jpg\" class=\"attachment-large size-large wp-image-29251\" alt=\"\" srcset=\"https:\/\/www.accscicn.com\/wp-content\/uploads\/2022\/12\/\u90bb\u8fd1\u6548\u5e94\u6821\u6b63\u6548\u679c\u5bf9\u6bd4-1.jpg 995w, https:\/\/www.accscicn.com\/wp-content\/uploads\/2022\/12\/\u90bb\u8fd1\u6548\u5e94\u6821\u6b63\u6548\u679c\u5bf9\u6bd4-1-300x206.jpg 300w, https:\/\/www.accscicn.com\/wp-content\/uploads\/2022\/12\/\u90bb\u8fd1\u6548\u5e94\u6821\u6b63\u6548\u679c\u5bf9\u6bd4-1-768x527.jpg 768w\" sizes=\"(max-width: 995px) 100vw, 995px\" \/>\t\t\t\t\t\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-0e744e1 elementor-widget elementor-widget-text-editor\" data-id=\"0e744e1\" data-element_type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t<div data-page-id=\"XNWvd0Er4ogPewxzjOMcotAXn9e\" data-docx-has-block-data=\"false\"><ul><li data-list=\"bullet\"><div><p><b>Compensaci\u00f3n de la exposici\u00f3n de fondo<\/b>Es adecuado para los sistemas de exposici\u00f3n de barrido de trama, en los que la distribuci\u00f3n de energ\u00eda se equilibra en todas las ubicaciones mediante la superposici\u00f3n de la energ\u00eda de la segunda exposici\u00f3n, lo que elimina la necesidad de calcular la distribuci\u00f3n de energ\u00eda, pero posiblemente reduce el contraste de la imagen expuesta.<\/p><\/div><\/li><\/ul><\/div>\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-c1dfb83 elementor-widget elementor-widget-text-editor\" data-id=\"c1dfb83\" data-element_type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t<p><strong>La forma m\u00e1s sencilla y eficaz de reducir el efecto de proximidad es aumentar la energ\u00eda del haz de electrones y reducir el grosor de la fotoresina del haz de electrones.<\/strong>Sin embargo, hay que tener en cuenta el potencial de da\u00f1o y sobrecalentamiento del sustrato debido a la elevada energ\u00eda del haz de electrones.<\/p>\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-cb5c2a0 elementor-widget elementor-widget-image\" data-id=\"cb5c2a0\" data-element_type=\"widget\" data-widget_type=\"image.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t\t\t\t\t\t\t<img loading=\"lazy\" decoding=\"async\" width=\"925\" height=\"925\" src=\"https:\/\/www.accscicn.com\/wp-content\/uploads\/2022\/12\/\u4e0d\u540c\u7535\u5b50\u80fd\u91cf\u5728\u7845\u6676\u7247\u4e0a\u7684\u7535\u5b50\u8f68\u8ff9.jpg\" class=\"attachment-large size-large wp-image-29253\" alt=\"\" srcset=\"https:\/\/www.accscicn.com\/wp-content\/uploads\/2022\/12\/\u4e0d\u540c\u7535\u5b50\u80fd\u91cf\u5728\u7845\u6676\u7247\u4e0a\u7684\u7535\u5b50\u8f68\u8ff9.jpg 925w, https:\/\/www.accscicn.com\/wp-content\/uploads\/2022\/12\/\u4e0d\u540c\u7535\u5b50\u80fd\u91cf\u5728\u7845\u6676\u7247\u4e0a\u7684\u7535\u5b50\u8f68\u8ff9-300x300.jpg 300w, https:\/\/www.accscicn.com\/wp-content\/uploads\/2022\/12\/\u4e0d\u540c\u7535\u5b50\u80fd\u91cf\u5728\u7845\u6676\u7247\u4e0a\u7684\u7535\u5b50\u8f68\u8ff9-150x150.jpg 150w, https:\/\/www.accscicn.com\/wp-content\/uploads\/2022\/12\/\u4e0d\u540c\u7535\u5b50\u80fd\u91cf\u5728\u7845\u6676\u7247\u4e0a\u7684\u7535\u5b50\u8f68\u8ff9-768x768.jpg 768w\" sizes=\"(max-width: 925px) 100vw, 925px\" \/>\t\t\t\t\t\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-560722b elementor-widget elementor-widget-heading\" data-id=\"560722b\" data-element_type=\"widget\" data-widget_type=\"heading.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t<h2 class=\"elementor-heading-title elementor-size-default\">Aplicaciones<\/h2>\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-b3a16e5 elementor-widget elementor-widget-text-editor\" data-id=\"b3a16e5\" data-element_type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t<p>M\u00e1scaras de alta precisi\u00f3n: la litograf\u00eda por haz de electrones tiene una amplia gama de aplicaciones en el campo de la fabricaci\u00f3n de m\u00e1scaras de alta precisi\u00f3n para circuitos integrados debido a su alta resoluci\u00f3n y a su tipo de escritura directa.\u00a0<\/p><p>Optoelectr\u00f3nica, como la creaci\u00f3n de prototipos de chips electr\u00f3nicos y optoelectr\u00f3nicos y la producci\u00f3n de peque\u00f1os lotes, la producci\u00f3n de peque\u00f1os lotes en las industrias de rejillas de difracci\u00f3n, \u00f3ptica binaria, micro\u00f3ptica y nano\u00f3ptica (conjuntos de microlentes, gu\u00edas de ondas \u00f3pticas) y superlentes de superficie, la personalizaci\u00f3n de dispositivos optoelectr\u00f3nicos especiales.<\/p>\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-bafc88b elementor-widget elementor-widget-image\" data-id=\"bafc88b\" data-element_type=\"widget\" data-widget_type=\"image.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t\t\t\t\t\t\t<img loading=\"lazy\" decoding=\"async\" width=\"1024\" height=\"819\" src=\"https:\/\/www.accscicn.com\/wp-content\/uploads\/2022\/12\/\u8d85\u900f\u955c-1024x819.jpg\" class=\"attachment-large size-large wp-image-29254\" alt=\"\" srcset=\"https:\/\/www.accscicn.com\/wp-content\/uploads\/2022\/12\/\u8d85\u900f\u955c-1024x819.jpg 1024w, https:\/\/www.accscicn.com\/wp-content\/uploads\/2022\/12\/\u8d85\u900f\u955c-300x240.jpg 300w, https:\/\/www.accscicn.com\/wp-content\/uploads\/2022\/12\/\u8d85\u900f\u955c-768x614.jpg 768w, https:\/\/www.accscicn.com\/wp-content\/uploads\/2022\/12\/\u8d85\u900f\u955c.jpg 1280w\" sizes=\"(max-width: 1024px) 100vw, 1024px\" \/>\t\t\t\t\t\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-aa93354 elementor-widget elementor-widget-spacer\" data-id=\"aa93354\" data-element_type=\"widget\" data-widget_type=\"spacer.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t<div class=\"elementor-spacer\">\n\t\t\t<div class=\"elementor-spacer-inner\"><\/div>\n\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-fc744bd elementor-widget elementor-widget-text-editor\" data-id=\"fc744bd\" data-element_type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t<p>Ofrecemos <a href=\"https:\/\/www.accscicn.com\/es\/nanofabricacion\/fabricacion-litografia\/\" target=\"_blank\" rel=\"noopener\"><b>Litograf\u00eda por haz de electrones \/ Servicios de dise\u00f1o de procesamiento de microestructuras y nanoestructuras<\/b><\/a>no dude en dejarnos un comentario.<\/p>\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-ed26017 elementor-widget elementor-widget-wpforms\" data-id=\"ed26017\" data-element_type=\"widget\" data-widget_type=\"wpforms.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t<div class=\"wpforms-container wpforms-container-full\" id=\"wpforms-26998\"><form id=\"wpforms-form-26998\" class=\"wpforms-validate wpforms-form wpforms-ajax-form\" data-formid=\"26998\" method=\"post\" enctype=\"multipart\/form-data\" action=\"\/es\/wp-json\/wp\/v2\/posts\/29236\" data-token=\"20f036a788b75cd79e232763d5557046\" data-trp-original-action=\"\/es\/wp-json\/wp\/v2\/posts\/29236\"><noscript class=\"wpforms-error-noscript\">Por favor, active JavaScript en su navegador para completar este formulario.<\/noscript><div class=\"wpforms-field-container\"><div id=\"wpforms-26998-field_4-container\" class=\"wpforms-field wpforms-field-email\" data-field-id=\"4\"><label class=\"wpforms-field-label\" for=\"wpforms-26998-field_4\">\u7535\u90ae <span class=\"wpforms-required-label\">*<\/span><\/label><div class=\"wpforms-field-row wpforms-field-large\"><div class=\"wpforms-field-row-block wpforms-one-half wpforms-first\"><input type=\"email\" id=\"wpforms-26998-field_4\" class=\"wpforms-field-required wpforms-field-email-primary\" name=\"wpforms[fields][4][primary]\" required><label for=\"wpforms-26998-field_4\" class=\"wpforms-field-sublabel after\">Correo electr\u00f3nico<\/label><\/div><div class=\"wpforms-field-row-block wpforms-one-half\"><input type=\"email\" id=\"wpforms-26998-field_4-secondary\" class=\"wpforms-field-email-secondary wpforms-field-required\" data-rule-confirm=\"#wpforms-26998-field_4\" name=\"wpforms[fields][4][secondary]\" required><label for=\"wpforms-26998-field_4-secondary\" class=\"wpforms-field-sublabel after\">Confirmar el correo electr\u00f3nico<\/label><\/div><\/div><\/div><div id=\"wpforms-26998-field_2-container\" class=\"wpforms-field wpforms-field-textarea\" data-field-id=\"2\"><label class=\"wpforms-field-label\" for=\"wpforms-26998-field_2\">Requisitos de micro y nanotecnolog\u00eda<\/label><textarea id=\"wpforms-26998-field_2\" class=\"wpforms-field-small\" name=\"wpforms[fields][2]\" ><\/textarea><\/div><\/div><div class=\"wpforms-submit-container\"><input type=\"hidden\" name=\"wpforms[id]\" value=\"26998\"><input type=\"hidden\" name=\"wpforms[author]\" value=\"2\"><button type=\"submit\" name=\"wpforms[submit]\" id=\"wpforms-submit-26998\" class=\"wpforms-submit\" data-alt-text=\"\u53d1\u9001\u4e2d\u2026\" data-submit-text=\"\u63d0\u4ea4\" aria-live=\"assertive\" value=\"wpforms-submit\">Enviar<\/button><img loading=\"lazy\" decoding=\"async\" src=\"https:\/\/www.accscicn.com\/wp-content\/plugins\/wpforms\/assets\/images\/submit-spin.svg\" class=\"wpforms-submit-spinner\" style=\"display: none;\" width=\"26\" height=\"26\" alt=\"Cargando\"><\/div><input type=\"hidden\" name=\"trp-form-language\" value=\"es\"\/><\/form><\/div>  <!-- .wpforms-container 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data-settings=\"{&quot;classic_columns&quot;:&quot;1&quot;,&quot;classic_columns_tablet&quot;:&quot;2&quot;,&quot;classic_columns_mobile&quot;:&quot;1&quot;,&quot;classic_row_gap&quot;:{&quot;unit&quot;:&quot;px&quot;,&quot;size&quot;:35,&quot;sizes&quot;:[]},&quot;classic_row_gap_tablet&quot;:{&quot;unit&quot;:&quot;px&quot;,&quot;size&quot;:&quot;&quot;,&quot;sizes&quot;:[]},&quot;classic_row_gap_mobile&quot;:{&quot;unit&quot;:&quot;px&quot;,&quot;size&quot;:&quot;&quot;,&quot;sizes&quot;:[]}}\" data-widget_type=\"posts.classic\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t<link rel=\"stylesheet\" href=\"https:\/\/www.accscicn.com\/wp-content\/plugins\/elementor-pro\/assets\/css\/widget-posts.min.css\">\t\t<div class=\"elementor-posts-container elementor-posts elementor-posts--skin-classic elementor-grid\">\n\t\t\t\t<article class=\"elementor-post elementor-grid-item post-29698 page type-page status-publish has-post-thumbnail hentry category-product category-nanofabrication tag-nanofabrication\">\n\t\t\t\t<a class=\"elementor-post__thumbnail__link\" href=\"https:\/\/www.accscicn.com\/es\/producto\/2pp-polimerizacion-de-dos-fotones\/\" tabindex=\"-1\" >\n\t\t\t<div class=\"elementor-post__thumbnail\"><img loading=\"lazy\" decoding=\"async\" width=\"300\" height=\"259\" src=\"https:\/\/www.accscicn.com\/wp-content\/uploads\/2024\/05\/\u5fae\u900f\u955c\u9635\u5217-300x259.png\" class=\"attachment-medium size-medium wp-image-29772\" alt=\"\" srcset=\"https:\/\/www.accscicn.com\/wp-content\/uploads\/2024\/05\/\u5fae\u900f\u955c\u9635\u5217-300x259.png 300w, https:\/\/www.accscicn.com\/wp-content\/uploads\/2024\/05\/\u5fae\u900f\u955c\u9635\u5217-14x12.png 14w, https:\/\/www.accscicn.com\/wp-content\/uploads\/2024\/05\/\u5fae\u900f\u955c\u9635\u5217.png 434w\" sizes=\"(max-width: 300px) 100vw, 300px\" \/><\/div>\n\t\t<\/a>\n\t\t\t\t<div class=\"elementor-post__text\">\n\t\t\t\t<h3 class=\"elementor-post__title\">\n\t\t\t<a href=\"https:\/\/www.accscicn.com\/es\/producto\/2pp-polimerizacion-de-dos-fotones\/\" >\n\t\t\t\tSistema de impresi\u00f3n 3D por polimerizaci\u00f3n bifot\u00f3nica de alta precisi\u00f3n\t\t\t<\/a>\n\t\t<\/h3>\n\t\t\n\t\t<a class=\"elementor-post__read-more\" href=\"https:\/\/www.accscicn.com\/es\/producto\/2pp-polimerizacion-de-dos-fotones\/\" aria-label=\"M\u00e1s informaci\u00f3n sobre Sistema de impresi\u00f3n 3D por polimerizaci\u00f3n bifot\u00f3nica de alta precisi\u00f3n\" tabindex=\"-1\" >\n\t\t\tLeer M\u00e1s \"\t\t<\/a>\n\n\t\t\t\t<\/div>\n\t\t\t\t<\/article>\n\t\t\t\t<article class=\"elementor-post elementor-grid-item post-27555 page type-page status-publish has-post-thumbnail hentry category-nanofabrication tag-nanofabrication\">\n\t\t\t\t<a class=\"elementor-post__thumbnail__link\" href=\"https:\/\/www.accscicn.com\/es\/nanofabricacion\/revestimiento-de-fabricacion\/\" tabindex=\"-1\" >\n\t\t\t<div class=\"elementor-post__thumbnail\"><img loading=\"lazy\" decoding=\"async\" width=\"300\" height=\"228\" src=\"https:\/\/www.accscicn.com\/wp-content\/uploads\/2022\/11\/cadence-comparison-\u78c1\u63a7\u6e85\u5c04\u9540\u819c-1-300x228.jpg\" class=\"attachment-medium size-medium wp-image-28958\" alt=\"\" srcset=\"https:\/\/www.accscicn.com\/wp-content\/uploads\/2022\/11\/cadence-comparison-\u78c1\u63a7\u6e85\u5c04\u9540\u819c-1-300x228.jpg 300w, https:\/\/www.accscicn.com\/wp-content\/uploads\/2022\/11\/cadence-comparison-\u78c1\u63a7\u6e85\u5c04\u9540\u819c-1.jpg 625w\" sizes=\"(max-width: 300px) 100vw, 300px\" \/><\/div>\n\t\t<\/a>\n\t\t\t\t<div class=\"elementor-post__text\">\n\t\t\t\t<h3 class=\"elementor-post__title\">\n\t\t\t<a href=\"https:\/\/www.accscicn.com\/es\/nanofabricacion\/revestimiento-de-fabricacion\/\" >\n\t\t\t\tMicro y nanoprocesado - Proceso de revestimiento\t\t\t<\/a>\n\t\t<\/h3>\n\t\t\n\t\t<a class=\"elementor-post__read-more\" href=\"https:\/\/www.accscicn.com\/es\/nanofabricacion\/revestimiento-de-fabricacion\/\" aria-label=\"M\u00e1s informaci\u00f3n sobre Micro-nano-procesado - Procesos de recubrimiento\" tabindex=\"-1\" >\n\t\t\tLeer M\u00e1s \"\t\t<\/a>\n\n\t\t\t\t<\/div>\n\t\t\t\t<\/article>\n\t\t\t\t<article class=\"elementor-post elementor-grid-item post-27547 page type-page status-publish has-post-thumbnail hentry category-nanofabrication tag-nanofabrication\">\n\t\t\t\t<a class=\"elementor-post__thumbnail__link\" href=\"https:\/\/www.accscicn.com\/es\/nanofabricacion\/grabado-de-fabricacion\/\" tabindex=\"-1\" >\n\t\t\t<div class=\"elementor-post__thumbnail\"><img loading=\"lazy\" decoding=\"async\" width=\"300\" height=\"285\" src=\"https:\/\/www.accscicn.com\/wp-content\/uploads\/2022\/06\/Slanted-3-300x285.jpg\" class=\"attachment-medium size-medium wp-image-26719\" alt=\"\" srcset=\"https:\/\/www.accscicn.com\/wp-content\/uploads\/2022\/06\/Slanted-3-300x285.jpg 300w, https:\/\/www.accscicn.com\/wp-content\/uploads\/2022\/06\/Slanted-3.jpg 744w\" sizes=\"(max-width: 300px) 100vw, 300px\" \/><\/div>\n\t\t<\/a>\n\t\t\t\t<div class=\"elementor-post__text\">\n\t\t\t\t<h3 class=\"elementor-post__title\">\n\t\t\t<a href=\"https:\/\/www.accscicn.com\/es\/nanofabricacion\/grabado-de-fabricacion\/\" >\n\t\t\t\tProcesado micro-nano - Grabado\t\t\t<\/a>\n\t\t<\/h3>\n\t\t\n\t\t<a class=\"elementor-post__read-more\" href=\"https:\/\/www.accscicn.com\/es\/nanofabricacion\/grabado-de-fabricacion\/\" aria-label=\"M\u00e1s informaci\u00f3n sobre Micro- y Nanofabricaci\u00f3n - Grabado\" tabindex=\"-1\" >\n\t\t\tLeer M\u00e1s \"\t\t<\/a>\n\n\t\t\t\t<\/div>\n\t\t\t\t<\/article>\n\t\t\t\t<\/div>\n\t\t\n\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-9b913b5 elementor-widget-divider--view-line elementor-widget elementor-widget-divider\" data-id=\"9b913b5\" data-element_type=\"widget\" data-widget_type=\"divider.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t<div class=\"elementor-divider\">\n\t\t\t<span class=\"elementor-divider-separator\">\n\t\t\t\t\t\t<\/span>\n\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-d596cd8 elementor-widget elementor-widget-heading\" data-id=\"d596cd8\" data-element_type=\"widget\" data-widget_type=\"heading.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t<div class=\"elementor-heading-title elementor-size-default\">Lecturas relacionadas<\/div>\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-ea0aeb4 elementor-grid-1 elementor-posts--thumbnail-none elementor-grid-tablet-2 elementor-grid-mobile-1 elementor-widget elementor-widget-posts\" data-id=\"ea0aeb4\" data-element_type=\"widget\" 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