With 10 years of micro/nano experience, our advanced micro/nano processing solutions ensure that you save time, effort and energy throughout the entire micro/nano manufacturing process, reducing significant cost waste as well as optimizing the efficiency and effectiveness of the entire production.

More than 100 schools and enterprises choose us

What is photolithography

Photolithography is a precision process for patterning parts on thin films or substrates (also known as "wafers"). Photolithography uses light to transfer geometric patterns from a photomask (also known as a "photomask") to a light-sensitive (i.e., photosensitive) chemical photoresist on a substrate.

Our Capabilities

Lithography process

Contact and proximity Lithograph

Minimum graphic size: 1μm, scribing accuracy: ±0.5μm

Lithography process

Laser direct writing
(Laser direct writing)

Femtosecond laser, two-photon polymerization 3D printing.Minimum graphic size 0.3um, scribing accuracy: ±0.5um;

Lithography process

Stepper Lithography
(Stepper Lithography)

Minimum graphic size: 200 nm, registration accuracy ≤ 0.15μm (X,Y), exposure range <22*22mm, support 8inch

Lithography process

Electron Beam Lithography (EBL)

Min. graphic size: 10nm, scribing accuracy: 40nm, exposure range < 100mm diameter

Lithography process

Scanning lithography
(Scanning Lithography)

Projection ratio 1:5, the minimum graphic size: 0.35μm, set of engraving accuracy ≤ 0.15μm (X,Y), exposure range <22 * 22mm

Lithography process

Ion Beam Lithography
(Ion beam lithography)

Minimum graphic size: 1μm, scribing accuracy: ±0.5μm

Lithography materials

Lithography materials

Common substrate materials

Silicon wafers, glass, sapphire, flexible materials, GaAs, etc.

Lithography materials

Substrate size

2, 4, 6, 8 inches and irregular small pieces

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Production Process

1. Preliminary offer

Send your drawings and requirements to our development manager for an initial quote

2. Program determination

We will optimize and determine the plan and quotation based on the drawings and requirements

3.Production and quality control

We will select the best equipment for your product and take full responsibility for your product to meet our standards.

4. Delivery on time

Delivered to you on time

Quality Inspection

Detection means

Optical microscopy (Microscopy)

Detection means

Profilometer (Profilometer)

Detection means

Sheet Resistance Measurement

Detection means

Hall measurement )

Cases we have done

Micro and nano structures

Diffractive Optical Elements (DOE)

Micro and nano structures

Superlenses (METALENSES)

Micro-Nano Architecture

Microlens arrays


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Micro and Nano Applications

Microlens arrays

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Micro and Nano Applications

Line grid polarizer

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Micro and Nano Applications


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Micro and Nano Applications

Flexible Electronics

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Micro and Nano Applications

Anti-reflective film

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Micro and Nano Applications

OLED Panel

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Micro and Nano Applications

Microfluidic channels/chips

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Micro and Nano Applications

AR Optical Waveguide

Our Advantages


Full process coverage

Cooperate with many domestic experiments and have different processing technology reserve from 100um-5nm


High standard quality control

We adhere to the spirit of 6sigma service, choose the most suitable experimental platform, process, personnel, materials for processing


Quick Response

From idea to implementation, our experts will provide professional advice and ongoingTrackingServices


Save time and worry

Turnkey service, from principle implementation, drawing design, raw material procurement, to finished product processing

Contact Us

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