Nanoimprinting (NIL)

Nanoimprinting (NIL) is the most cost-effective process to produce large area nano-scale patterns. AccSci has more than 10 years of experience in micro and nanoimprinting technology, which can help you save time, trouble and effort in the process, reduce a lot of cost waste and optimize the efficiency and effectiveness of the whole production.

More than 100 schools and enterprises choose us

What is nanoimprinting (Nil)?

Nanoimprint lithography (NIL) is a micro and nano process for creating nanoscale patterns.It is the most common method for processing polymer structures. HavingLow cost, ,Short construction period, ,High yield, ,High resolutionThe advantages of the product include

The main mature and commonly used nanoimprinting technology processes are.Nano Thermal Imprinting (T-NIL) Technology, ,UV-NIL (Ultraviolet Light Curing Imprinting) technology, theMicroContact Printing( μCP).

Our Capabilities


Electron beam lithography (EBL)UV lithographyProximity/contact lithography, stepper lithography, etc.


Two-photon 3D printing (Two-photonpolymerization)

Focused Ion Beam EtchingDeep reactive ion etching, inductively coupled plasma etching, ion beam sputtering etching, etc.

Nano-thermal embossing, UV-curable embossing, micro-contact printing (soft etching)



Magnetron sputteringAtomic layer deposition.Ion beam sputtering, ,Plasma chemical vapor deposition, etc.

Nano-imprinting materials

Lithography materials

Imprinting stencil material

Silicon NIL Stamps, Fused Silica NIL Stamps, Nickel SHIM, Polymer NIL Stamps, PDMS NIL Stamps

Nano-imprinting materials

Substrate material

Sapphire, quartz, silicon (Si), nickel (Ni), polydimethylsiloxane (PDMS), gallium arsenide (GaAs), indium phosphide (InP), gallium nitride (GaN), titanium (Ti), gold (Au), polyethylene (PE) and other substrate materials
silicon-wafer-synthesis-laboratory-nano-science-research-center-donostia-san-sebastian-gipuzkoa-basque-country-spain-europe-RKD3M7 .jpg

The case of nanoimprinting

Micro and nano structures

Diffractive Optical Elements (DOE)

Micro and nano structures

Superlenses (METALENSES)

Micro-Nano Architecture

Microlens arrays

Production Process

1. Preliminary offer

Send your drawings and requirements to our development manager for an initial quote

2. Program determination

We will optimize and determine the plan and quotation based on the drawings and requirements

3.Production and quality control

We will select the best equipment for your product and take full responsibility for your product to meet our standards.

4. Delivery on time

Delivered to you on time

Test characterization

Detection means

Optical microscopy (Microscopy)

Detection means

Profilometer (Profilometer)

Detection means

Sheet Resistance Measurement

Detection means

Hall measurement )

Our Advantages


Full process coverage

Cooperate with many domestic experiments and have different processing technology reserve from 100um-5nm


High standard quality control

We adhere to the spirit of 6sigma service, choose the most suitable experimental platform, process, personnel, materials for processing


Quick Response

From idea to implementation, our experts will provide professional advice and ongoingTrackingServices


Save time and worry

Turnkey service, from principle implementation, drawing design, raw material procurement, to finished product processing

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